mentioned

English

Welcome to the website of Inoue & Associates

Introductory Statement

Inoue & Associates (located within 1 minute walk from the Japan Patent Office) is an intellectual property (IP) firm having more than 35 years of experience in international IP business.

We are a modest-sized IP firm composed of members each having profound knowledge about the legal aspect of IP and the technologies involved therein as well as excellent skill in actual IP practice, such that high quality services can be offered constantly at a reasonable price.  Each one of our staff members is so trained as to be able to always provide high quality IP-related services including production of documents having a clear and logical construction whether they are in English or Japanese and irrespective of urgency or technical difficulties involved in particular cases.

Over the years, we have built up a solid reputation for our ability to efficiently acquire and protect IP rights in Japan.

We are confident that we can provide higher quality IP services than any other IP firms in Japan.


Features of Inoue & Associates

For acquiring and protecting patent rights, everything starts from the claims and specification of a patent application or a granted patent.  Whether a patent application can be granted with a desired protective scope or a granted patent can survive the challenge from a third party depends utterly on how good the claims and specification have been drafted in the first place.

Invalidation of patents, unexpectedly narrow scope of protection, defeat in infringement suit … all such undesired outcome could have been avoided only if the patent application had been better drafted. 

In the case of Japanese patent applications filed by non-Japanese entities, the claims and specification are usually translations from the non-Japanese texts of the first filed foreign applications or PCT applications. 

From this perspective, the translation of the patent claims and specification is actually more than just a translation and is practically tantamount to the preparation of a legal document which serves as a basis for seeking patent protection.  For this reason, the translation should be done with utmost care by IP professionals such as experienced patent attorneys or paralegals

And that is what we do and is not done by most of the IP firms in Japan

 

Problems related to traditional way of handling patent applications from outside Japan

In typical Japanese IP firms, applications from foreign clients are handled by a team of an IP professional (a patent attorney or a paralegal) and a translator. For example, the translation of a PCT specification for the Japan national phase entry is often carried out by one who is the least experienced in the IP firm or even by an outside translator.

The IP professions work on legal matters based on the translations prepared by translators which are not always so good or of a rather poor quality in many cases. This manner of handling patents is disadvantageous not only from the aspect of efficiency but also from the aspect of cost because poor translations of course make the entire procedure unnecessarily complicated and high translation fees are required even if the translations are not so good. Such inefficient and problematic practice as mentioned above has become customary because many Japanese IP professionals are not good at writing in English or even reading English documents, and the English-to-Japanese translations are generally assigned to beginners.

Consequently, many Japanese IP professionals have to rely on poor translations in their works, thus falling into a vicious cycle. It is not surprising even if patent applications from foreign clients are handled by those who do not fully understand what is disclosed in the original specification nor the clients’ instructions given in English during the prosecution of the application. For years, this has been a serious problem as far as the patent applications from outside Japan are concerned.

Our Solution

Such problems as mentioned above will never happen in the case of Inoue & Associates. Every one of our staff members has gone through very hard training and long actual experience to acquire ability to handle the IP cases alone from drafting patent specifications whether they are in Japanese or English to dealing with various procedures relating to patent applications or registered patents. We do not need and actually do not use any translator. Even in the case of foreign patent applications (in US, EP etc.) filed by Japanese applicants through our firm, the US or European patent attorneys often use our draft documents without any substantial change. That is, the documents drafted by Inoue & Associates as such are often submitted to the USPTO or the EPO.

There is no magic formula for acquiring good IP rights. This can be achieved only by hard work and skill obtainable through long and rich experience as always required in any fields for realizing high quality services.

Inoue & Associates is one of the very limited number of Japanese IP firms capable of constantly offering high quality IP services at a reasonable price. There has been and will be no compromise in the quality of services we provide to our clients and, for this very reason, we have been trusted by many foreign clients as well as domestic clients.

Our skill in IP business is highly esteemed by our clients including two famous Japanese professors emeriti, Dr. Nobuatsu Watanabe and Dr. Hidefumi Hirai, whose recommendations are shown in this web site. Further, if requested, we will be able to show you copies of some letters from various US and EP attorneys praising our abilities.

Our highly-skilled staff members will surely be of great help to your establishment of strong and valuable intellectual property portfolio while reducing cost.

If you are not sure, try us and we promise that we will never fall short of your expectations. You will immediately realize that we are dedicated to efficient acquisition and protection of your valuable intellectual properties and have skills to achieve this goal.

タグ:

PCT  EPO  application  or  be  patent  USPTO  Japan  an  Patent  Japanese  not  with  filed  claim  Office  EP  at  one  art  claims  any  has  grant  applications  request  above  file  only  been  case  within  such  use  other  into  IP  Statement  phase  will  European  we  more  documents  should  under  specification  than  mentioned  related  all  but  right  problem  having  non  services  We  also  inter  through  third  there  registered  based  go  patents  translations  applicant  so  excellent  ex  about  high  rights  practice  foreign  technical  required  scope  reasonable  even  re  fee  granted  years  each  end  without  Inoue  legal  party  business  English  national  Further  form  prepared  cases  etc  long  general  out  shown  including  international  skill  two  first  need  quality  properties  example  because  many  skilled  during  prosecution  provide  amount  their  least  do  year  Associates  very  clients  substantial  usually  respect  firm  given  translation  some  experience  ep  Intellectual  those  protection  clear  carried  obtain  original  Problem  make  matter  Property  side  efficiency  reason  knowledge  well  had  infringement  who  document  Solution  staff  construction  cost  limit  course  therein  Such  country  basis  production  they  outside  various  her  specifications  found  firms  per  applicants  see  good  am  poor  work  always  website  whether  product  attorneys  property  entry  intellectual  drafted  his  herein  expectation  limited  often  nor  members  disclosed  could  submitted  thus  understand  valid  web  vice  what  instruction  require  reading  ratio  ability  become  number  actually  act  place  closed  located  There  part  particular  care  specific  surely  far  fees  field  start  every  draft  how  highly  service  aspect  fields  desired  complicated  entire  concerned  change  capable  exam  done  Invalidation  Consequently  Trademark  Trade  advantage  able  acquire  actual  Services  valuable  late  requested  unexpected  instructions  short  show  serious  up  involved  isa  own  professionals  professional  problems  procedure  practically  minute  protecting  now  most  skills  immediately  texts  fully  handling  handled  submit  help  translator  solid  never  oa  State  abilities  man  advantageous  acquiring  logical  mm  Watanabe  manner  rather  read  Hirai  Hidefumi  red  professor  procedures  protective  price  Nobuatsu  fr  full  depends  generally  constantly  higher  hard  great  experienced  efficiently  establish  entities  everything  esteemed  ed  domestic  ip  avoided  attorney  Dr  Each  suit  try  trusted  Even  Every  rich  surprising  An  site  works  signed  way  while  utmost  trained  reputation 

宣誓供述書の書き方について(2):米国(Part 2)

[例2] この例においては、[例1]のように宣誓供述書の供述内容を別紙のExhibit(甲号証又は乙号証)とはしていません。また、発明者以外によって署名された例です。

内容としては、医療装置(変形爪の矯正装置)に関する二次的考慮事項(商業的成功など)に関して提出したものです。(米国出願の中間処理において弊所が実際に提出したものに基づいていますが、固有名詞・用語・数値などは適宜変更してあります。)

(商業的成功に関する宣誓供述書の書式の1例)

IN THE U.S. PATENT AND TRADEMARK OFFICE

Applicant:Taro YAMADA
Serial No.:XX/XXX,XXX
Filed:XXXX, 20XX
For:APPARATUS FOR CORRECTING AN INGROWN NAIL
Art Unit:3772
Examiner:Dan HICKS

 



DECLARATION UNDER 37 C.F.R. 1.132

 

    I, Goro Kimura, a Japanese citizen residing at XXXX, Tokyo, Japan, declare and say: 
    I was graduated from the Faculty of Medicine, XXX University in March 2005.
    In April 2005, I entered XYZ Clinic where I have been practicing the treatment of hallux valgus and ingrown nails.
    I am well familiar with the present case.
    I read and understood the Office Action dated XXXX, 2011 and references cited therein. I have carried out treatments of ingrown nails with the apparatus disclosed in claim 1 of the present application at XYZ Clinic following the instructions given by Mr. Taro Yamada who is the director of the clinic and is the inventor of the present application. Some of the results of the treatments are as reported in the website of XYZ Clinic at http://www.adcdefg-hijk.com.
    In the website, three cases of treatments are reported.  The treatments were performed using an apparatus as shown in Fig. A attached hereto.  As can be seen from Fig. A, the apparatus falls within the scope of claim 1 of the present application.
    As to the three cases (cases 1 to 3), the nails before and after the treatments are shown in Figs. B, C and D attached hereto, which are also shown at the above-mentioned website of XYZ Clinic.  In each of the tree treatments, the apparatus as shown in Fig. A was used as mentioned above.  Further, the reagents and operations in cases 1 to 3 were substantially the same as recited in Example 1 of the present application (paragraphs [00XX] to [00XX] of the specification of the present application) except that the inclination angle A of the lifting members, the lifting intervals and the nail correcting force were slightly varied depending on the characteristics of the ingrown nails of the patients.  As reported in the website of XYZ Clinic, the details of cases 1 to 3 are as follows.

Case 1:
Patient's gender and age:
    A female in her 30's.

Patient's background: 
    The patient wished to avoid a painful treatment because she had heard her acquaintance's report about having received a very painful operation for correcting an ingrown nail at another hospital which seemed to have been carried out without anesthesia.  The patient came to XYZ Clinic because she was attracted by the painless treatment of this clinic.

Results:
    The ingrown nail was corrected as shown in Fig. B by a single treatment which took about only 30 minutes.  The patient was satisfied with the results of the treatment because the ingrown nail had been corrected without feeling any pain during and after the treatment.

Case 2:
Patient's gender and age:
 
    A female in her 40's.

Patient's background: 
    The patient had a previous experience of nail-correction using a wire device which is to be hooked to the edges of the ingrown sides of the nail and is designed to lift the ingrown sides by pulling the hooked portions of the wire toward the center of the nail.
    However, she needed to go to the hospital so frequently that it became troublesome to her. As a result, the patient stopped going to the hospital before the completion of the nail correction.
    The patient also had a previous experience of nail-correction using a correction plate which is to be adhered on the surface of an ingrown nail and lifts the ingrown sides of the nail by the spring force of the plate, but the plate came off from the nail soon.

Results: 
    The ingrown nail was corrected as shown in Fig. C by performing twice an approx. 30-minute treatment, and the patient was pleased with the result.

Case 3:
Patient's gender and age: 
    A female in her 50's.

Patient's background: 
    Previously, the patient had her ingrown nail corrected by treatment using a wire device similar to that used by the patient of case 2, which treatment lasted about 18 months. However, the ingrown nail recurred after the termination of the treatment.

Results: 
    The ingrown nail was corrected as shown in Fig. D by a single approx. 30-minute treatment.  During and after the treatment, the patient did not feel any pain nor uncomfortable feeling.

    Finally, it should be added that almost all of the 900 patients having received this treatment so far were very satisfied with the results.

    From the above, it is apparent that the apparatus of the present invention surely enables the correction of an ingrown nail within a very short period of time, 1.e., within about 30 minutes to about 1 hour, with a very simple operation and without causing any pain nor uncomfortable feeling to the patent.
    Thus, the apparatus of the present invention has realized a surprisingly easy and effective treatment which is far more advantageous than the conventional surgical removal method which is complicated, cumbersome and is accompanied by pain during or after the surgery and risk of microbial infection, and the conventional treatments using various correction devices or apparatuses which are in many cases not so effective and require very long treatment periods.

    The undersigned petitioner declares that all statements made herein of his own knowledge are true and that all statements made on information and belief are believed to be true; and further that these statements were made with the knowledge that willful false statements and the like so made are punishable by fine or imprisonment, or both, under Section 1001 of Title 18 of the United States Code and that such willful false statements may jeopardize the validity of the application or any patent issuing thereon.

Date:

(宣誓者の署名)
Goro Kimura

タグ:

米国  出願  発明  提出  application  or  be  patent  弊所  宣誓供述書  Japan  an  Japanese  not  with  design  変更  考慮  Final  claim  実際  Action  米国出願  period  Office  発明者  date  at  one  rce  invention  present  after  any  内容  has  treatment  above  epo  report  only  been  www  case  within  書式  such  use  other  may  months  will  以外  we  more  should  method  under  specification  than  made  事項  mentioned  results  all  but  中間処理  having  処理  Act  also  same  inter  information  was  there  用語  go  Art  nail  both  so  Case  ex  effective  about  医療  University  following  ingrown  time  scope  re  parent  fee  month  similar  each  end  without  residing  However  single  供述内容  署名  中間  Applicant  April  before  Further  装置  Exhibit  treatments  form  using  cases  XXXX  long  statements  成功  further  patient  out  XX  shown  inventor  need  state  Tokyo  数値  United  because  Ex  many  Examiner  during  有名  Mr  used  宣誓  PATENT  were  States  very  宣誓者  correction  substantial  follows  given  XXX  some  where  experience  ep  carried  Clinic  side  knowledge  recited  well  had  商業的成功  true  reference  who  like  供述書  cited  details  another  apparatus  device  declare  Fig  therein  these  willful  satisfied  petition  references  various  her  別紙  per  pending  Patient  see  Date  three  am  XYZ  Title  received  website  back  term  corrected  his  herein  result  March  statement  OFFICE  nor  Example  EC  citizen  convention  members  disclosed  dated  thereon  understood  valid  undersigned  二次的考慮事項  固有名詞  web  vice  宣誓供述  instruction  portion  issuing  depending  require  reported  ratio  nails  background  added  act  performed  petitioner  plate  closed  kg  less  pain  specific  DECLARATION  she  false  surely  far  substantially  how  Faculty  believed  feeling  apparent  female  devices  attached  familiar  complicated  conventional  発明者以外  How  20XX  Taro  Thus  UNDER  TRADEMARK  advantage  able  適宜変更  Results  say  late  wire  instructions  short  show  sides  own  previous  please  perform  商業的  minute  now  most  took  surface  hospital  ground  graduated  hereto  gender  二次的  乙号証  Section  Serial  Some  State  Re  painful  operations  operation  YAMADA  man  lifting  advantageous  accompanied  low  minutes  Unit  read  Kimura  punishable  red  periods  performing  patients  practicing  fr  declares  forming  force  hooked  correcting  except  effect  entered  enables  ed  fine  easy  became  invent  jeopardize  belief  believe  almost  approx  imprisonment  clinic  inform  came  characteristics  validity  uses  surgical  surprising  uncomfortable  site  simple  Code  signed  DE  Goro  toward  00XX  Finally  Filed 

《特許出願明細書》

分野 : バイオテクノロジー(細胞生物学) (和英)

原文:

更に、MAPKキナーゼの活性化には、キナーゼドメインVIIとVIIIの境界領域にある2つのセリン及び/又はスレオニン残基(即ち、2つのセリン残基、2つのスレオニン残基又はセリンとスレオニン残基)のリン酸化が必要で、このリン酸化を担うセリン/スレオニンキナーゼをMAPKKキナーゼ(MAPKKK)と総称する。前記のRaf-1はMAPKKキナーゼの一種であり、Ras→Raf-1(即ち、MAPKKK)→MAPKK→MAPKという連鎖は、シグナル伝達の主要経路の一つである。MAPKKK→MAPKK→MAPKという3分子からなるキナーゼの連鎖をMAPキナーゼシグナルカスケードと呼ぶ。

英訳文:

For activating a MAPK kinase, it is necessary to phosphorylate two serine and/or threonine residues (i.e., two serine residues, two threonine residues, or one serine residue and one threonine residue) located in the boundary region between the kinase subdomains VII and VIII, and a serine/threonine kinase responsible for this phosphorylation is designated MAPKK kinase (MAPKKK). The above-mentioned Raf-1 is one example of MAPKK kinase, and the following cascade reaction: Ras → Raf-1 (i.e., MAPKKK) → MAPKK → MAPK, is one of the major signal transduction pathways. The cascade reaction consisting of three kinase molecules, MAPKKK → MAPKK → MAPK, is called a MAP kinase signal cascade.

分野:バイオテクノロジー(遺伝子工学) (和英)

原文:

SIIS-1発現プラスミドの構築上記(ii)で単離したSIIS-1cDNAを制限酵素XbalとPvuIIで消化し、得られた制限酵素断片をブラントエンド化し、哺乳動物発現ベクターpEF-BOSのブラントエンド化したXbalサイトに挿入した。以下、構築したSIIS-1発現ベクターをpEF-BOS/SIIS-1(SH+)とする。SH2領域を欠損した変異型SIIS-1を構築するために、pEF-BOS/SIIS-1(SH+)を制限酵素BssHIIで消化し、生じた360bpの断片を除去した。得られたSH2領 域及びC末端の領域を欠損したSIIS-1発現ベクター(即ち、SIIS-1変異ベクター)を、pEF-BOS/SIIS-1(SH-)とした。 上記で構築したpEF-BOS/SIIS-1(SH+)又はpEF-BOS/SIIS-1(SH-)のいずれか一方の発現ベクターとネオマイシン耐性遺伝子をコードするpSV2 Neoとを20:1の比率で混ぜ、M1細胞にエレクトロポレーション法で形質導入した。ネオマイシン耐性を指標とし、形質導入体(クローン)をGeneticin(米国、GIBCOBRL社製)750μg/mlを含む成長培地中で選択した。

英訳文:

Construction of SIIS-1 expression vectors: SIIS-1 cDNA isolated in step (ii) above was digested with restriction enzymes XbaI and PvuII, and the end of the obtained restriction fragment (XbaI-PvuII) was converted into a blunt end. Then, the resultant blunt-ended fragment was inserted into the blunt-ended XbaI site of the mammalian expression vector pEF-BOS. Hereinafter, the constructed SIIS-1 expression vector is simply referred to as "pEF-BOS/SIIS-1 (SH+)". For the construction of a mutant SIIS-1 which is an SH2 domain-deficient SIIS-1, a BssHII-digested fragment of 360 bp was removed from pEF-BOS/SIIS-1 (SH+). The thus obtained SIIS-1 expression vector (that is, a mutant SIIS-1 vector) which is deficient in the SH2 domain and is truncated at the C-terminus is hereinafter simply referred to as "pEF-BOS/SIIS-1 (SH-)". Each of the expression vectors pEF-BOS/SIIS-1 (SH+) and pEF-BOS/SIIS-1 (SH-) prepared above was individually mixed with expression vector pSV2 Neo (encoding a neomycin-resistance gene) at a ratio of 20:1. Subsequently, each of the resultant vector mixtures was separately transfected into M1 cells by electroporation. Using neomycin resistance as an index, the transfectants (i.e., clones) were selected in the growth medium containing Geneticin (manufactured and sold by GIBCO BRL, USA) at 750 μg/ml.

分野 : 樹脂成形 (和英)

原文:

本発明の発泡射出成形方法によれば、金型キャビティ内壁面形状の転写性が良好で、無発泡の表皮層と高発泡の発泡層を有する成形品を再現性良く、効率的、経済的に製造することができるだけでなく、成形品の表皮層の厚さおよび成形品の発泡倍率を容易に制御することができる。

英訳文:

The foam-injection molding method of the present invention is advantageous not only in that a molded article which exhibits excellent reproduction of the morphology of the inner wall of the mold cavity and which has both a non-foamed surface skin layer and a highly foamed interior portion can be produced with excellent reproducibility and high efficiency and economically, but also in that the thickness of the surface skin layer and the expansion ratio of the molded article can be easily controlled. The foam-injection molding method of the present invention can provide various excellent foam-injection molded articles of a thermoplastic resin at a low cost.

分野 : 電気工学 (和英)

原文:

本発明は、複合色素及びn型半導体を包含する光電変換素子であって、該複合色素は、互いに 異なる励起準位を有する複数の成分色素が互いに化学結合されてなり、それにより、電子移動用の直鎖又は枝分かれ構造体を形成し、該直鎖又は枝分かれ構造体は一端において該n型半導体に保持され、他端は自由端であり、その励起準位が該直鎖又は枝分かれ構造体の上記のn型半導体に保持された端部から、上記の自由端に向かって減少する順序で配列されていることを特徴とする光電変換素子に関する。

英訳文:

The present invention is concerned with a photoelectric conversion element comprising a composite dye and an n-type semiconductor, the composite dye comprising a plurality of component dyes which have different excitation levels and which are chemically bonded to each other to form a straight chain or branched structure for transferring an electron therethrough, wherein the straight chain or branched structure is, at one end thereof, secured to the n-type semiconductor and has, at least at one other end thereof, a free end, and wherein the plurality of component dyes are arranged in an order such that the excitation levels of the plurality of component dyes are decreased as viewed from the one end of the structure toward the at least one other end of the structure.

分野 : 電気工学 (和英)

原文:

本発明の光電変換素子は、光電変換性能に優れ、特に、太陽エネルギーからのエネルギー取り 出し効率(エネルギー変換効率)が高く、また、それを用いて簡便に色素増感型太陽電池を製造 することができるので、色素増感型太陽電池などに有利に用いられる。

英訳文:

The photoelectric conversion element of the present invention exhibits excellent photoelectric conversion properties, especially high efficiency in converting solar energy to electric energy (i.e., high energy conversion efficiency), and a dye sensitized solar battery can be easily produced therefrom. Therefore, the photoelectric conversion element of the present invention can be advantageously used for a dye sensitized solar battery and the like.

分野 : 樹脂成形 (和英)

原文:

文明社会はエネルギーの消費によって成立するが、そのエネルギーの大部分は、自然が長年か けて太陽光エネルギーを蓄えた化石燃料に由来する。近年、その化石燃料の減少やその燃焼に よる地球温暖化問題が、人類社会の持続的発展の足かせとなる危惧が高まっている。 これらの問題を解決するために、太陽エネルギーから直接エネルギーを取り出す研究開発が盛 んに行われている。これらの中で、太陽電池は太陽エネルギーからのエネルギー取り出し効率 (エネルギー変換効率)が高いため多くの研究が為されている。とりわけ、色素に代表される光 増感剤を用い、その励起電子を効率よく取り出すことが可能な色素増感型太陽電池は、Michae l Gratzel等によって、エネルギー変換効率が7%を超えるシステムが発表(Nature 1991,353,737参照)されて以来、複雑な製造工程を経ず、安価に製造できる次世代の太陽 電池として注目を集めている。

英訳文:

Consumption of energy is indispensable to civilized society. Most of the energy which is consumed by civilized society is derived from fossil fuels, in which sunray energy has been accumulated over many years. In recent years, the problem that the amount of fossil fuels available is being reduced and the problem that the burning of fossil fuels causes global warming have arisen, and there is an increasing fear that these problems will be obstacles to the sustainable development of human society. For solving the above-mentioned problems, various studies have been made to directly utilize sunray energy. Among these studies, the studies on solar batteries have been vigorously made, because solar batteries exhibit high efficiency in converting solar energy to electric energy (i.e., high energy conversion efficiency). Among the solar batteries, special attention has been paid to a dye sensitized solar battery, which uses a photosensitizer, such as a dye, and which is capable of efficiently taking out electrons from the photosensitizer by the irradiation of the photosensitizer with sunray. Specifically, since Michael Gratzel et al. reported a system which uses a dye sensitized solar battery having an energy conversion efficiency of more than 7 % (see Nature 1991, 353, 737), a dye sensitized solar battery has drawn special attention as the next generation solar battery which can be produced at a low cost without use of a complicated method.

分野 : 鉄鋼技術、機械 (英和)

原文:

A production line for manufacturing hot steel strips from two casting lines (a, b) for thin slabs of thickness < 100 mm, only one of which (a) is aligned with a rolling line (e, g) characterized by comprising superimposed heating furnaces with mandrel (Al, A.2; Bl, B2), one pair on line (a) and one on line (b) respectively, both provided with internal mandrel to allow winding/unwinding steps of pre-strips having thickness lower than 30 mm, further comprising a bypass length (d) between said two furnaces (Al, A2) for the endless rolling in a finishing rolling mill (g) through a roller path (e), and a transverse path (k.) for transferring said pair of furnaces (Bl, B2) from line (b) to line (a) fox the production of single strips, there being provided an induction furnace (f) downstream of said heating furnaces with mandrel and immediately upstream of said finishing rolling mill (g).

和訳文:

熱間鋼帯を製造するための製造ラインであって、厚み100mm未満の薄いスラブ製造用の2つの鋳造ライン(a)及び(b)、該鋳造ライン(a)と直列に配置されてなる、ローラーコンベア(e)及び仕上用圧延機(g)を含む圧延ライン、上下に重なり合った加熱炉(A1)及び(A2)であって、該鋳造ライン(a)で製造されたスラブから得られる厚み30mm未満の仕上前鋳片の巻き取り及び巻き出し用マンドレルを内部に有しており、該鋳造ライン(a)に設けられた加熱炉(A1)及び(A2)、上下に重なり合った加熱炉(B1)及び(B2)であって、該鋳造ライン(b)で製造されたスラブから得られる厚み30mm未満の仕上前鋳片の巻き取り及び巻き出し用マンドレルを内部に有しており、鋳造ライン(b)に設けられた加熱炉(B1)及び(B2)、該鋳造ライン(a)で製造されたスラブを、ローラーコンベア(e)を介して仕上用圧延機(g)で連続的圧延に付すためのバイパス経路(d)であって、加熱炉(A1)と(A2)との間に設けられたバイパス経路(d)、加熱炉(B1)及び(B2)を、鋳造ライン(b)から鋳造ライン(a)に移動するための横断経路(k)、及びマンドレルを有する該加熱炉の下流であって、該仕上用圧延機(g)の直上流に設けられた誘導炉(f)、を含むことを特徴とする製造ライン。

タグ:

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《拒絶理由通知、特許査定》

拒絶理由通知(和英)

原文:

 

拒絶理由通知書

特許出願の番号      特願2009-XXXXXX

起案日          平成21年XX月XX日

特許庁審査官       XX XX        3409 2J00

特許出願人代理人     XX XX 様

適用条文         第29条第2項

 

 この出願は、次の理由によって拒絶をすべきものです。これについて意見がありましたら、この通知書の発送の日から60日以内に意見書を提出してください。

理 由

 

 この出願の下記の請求項に係る発明は、その出願前日本国内又は外国において頒布された下記の刊行物に記載された発明又は電気通信回線を通じて公衆に利用可能となった発明に基いて、その出願前にその発明の属する技術の分野における通常の知識を有する者が容易に発明をすることができたものであるから、特許法第29条第2項の規定により特許を受けることができない。

記 (引用文献等は引用文献等一覧参照)

 ・請求項6 に対して 引用文献1,2

  請求項6には、「請求項1の方法を実施するために用いるシステムであって」と記載されているが、この記載は、システムの構成を限定するものではない。

 引用文献1には、被検査体の内部を減圧し、超音波を用いて被検査体の内圧を測定し、漏洩孔の有無を検査する装置が開示されている。

 そして、引用文献2には、圧力を超音波の位相差に基づいて測定する構成が開示されており、また、どのような手法により圧力を測定するかは、当業者が適宜選択すべき事項である。

 してみれば、引用文献1に記載の発明において、引用文献2に記載の圧力測定を採用することで、本願請求項6に係る発明とすることは、当業者にとって容易に想到し得ることである。

 よって、引用文献1,2に記載の発明に基いて、本願請求項6に係る発明とすることは、当業者にとって容易に想到し得ることである。


<拒絶の理由を発見しない請求項>

 請求項1-5に係る発明については、現時点では、拒絶の理由を発見しない。

拒絶の理由が新たに発見された場合には拒絶の理由が通知される。

引 用 文 献 等 一 覧

1.特開2004-XXXXX号公報

2.特開2002-XXXXXX号公報

------------------------------------

先行技術文献調査結果の記録

・調査した分野  IPC G01M3/00-3/40

             G01L11/00-11/06

・先行技術文献 

  特開2006-XXXXX号公報

  特開昭60-XXXXXX号公報

 この先行技術文献調査結果の記録は、拒絶理由を構成するものではない。

 この拒絶理由通知の内容に関するお問い合わせ、または面接のご希望がございましたら下記までご連絡下さい。

特許審査第1部 材料分析  XXXX

TEL.03(XXXX)XXXX 内線XXXX

 

英訳文:

Notification of Reasons for Refusal

Patent Application No.:    2009-XXXXXX

Drafting Date:   XXXXXX, 2009

Examiner:   XXXXXXX         3409 2J00

Agent for Applicant:  XXXXX XXXXXXX

Articles of the Patent Law applied to: Article 29, item 2

     The present application should be rejected for the following reasons.  A response to this notification, if any, should be filed within 60 days from the date of mailing of this notification. 

REASONS

     The invention of the below-mentioned claim of the present application could be easily made by those having ordinary skill in the art, based on either an invention described in the below-mentioned publications which were distributed prior to the filing date of the present application in Japan or in a foreign country or an invention which became available to the public through electric telecommunication lines prior to the filing date of the present application.  Therefore, the invention of the below-mentioned claim of the present application should not be patented under Article 29, item 2 of the Patent Law.

NOTE (References cited herein are listed below)

• Claim 6  -  to be rejected over References 1 and 2

     Claim 6 has a description reading: “a system for practicing the method of claim 1”.  However, this description does not limit the construction of the system.

     Reference 1 discloses an apparatus for performing a method comprising decompressing the inside of a test subject and measuring the internal pressure of the test subject by using an ultrasonic wave, to thereby determine the presence or absence of a leak hole.

     Reference 2 discloses a construction for measuring a pressure, based on a phase difference of ultrasonic waves.  Those having ordinary skill in the art may appropriately choose how to measure a pressure.

     Thus, it would be easy for those having ordinary skill in the art to use the pressure measurement technique of Reference 2 in the invention of Reference 1, to thereby make the invention of claim 6 of the present application.

     Therefore, based on the inventions of References 1 and 2, the invention of claim 6 of the present application would have been easily conceived by those having ordinary skill in the art.


     At present, there has been found no reason to reject claims 1 to 5.

     A further office action will be issued when there is found any reason to reject claims 1 to 5.

List of references cited

1.   Unexamined Japanese Patent Application Laid-Open Specification No. 2004-XXXXX

2.   Unexamined Japanese Patent Application Laid-Open Specification No. 2002-XXXXXX

--------------------------------------------------------------

Record of the results of the prior art search

• Field searched   IPC  G01M3/00-3/40

                           G01L11/00-11/06

• Prior art documents  

     Unexamined Japanese Patent Application Laid-Open Specification No. 2006-XXXXX

     Unexamined Japanese Patent Application Laid-Open Specification No. Sho 60-XXXXXX

      The above record of the prior art search does not constitute the reasons for rejection.

      If there is any question about the content of this notification of reasons for rejection or if an interview is desired, please contact the following person.

Examination Division 1, Materials Analysis, XXXXX XXXXX

TEL 03(XXXX)XXXX  Extension XXXX

 

特許査定(和英)

原文:

特許査定

特許出願の番号      特願2007-XXXXXX

起案日          平成20年 X月XX日

特許庁審査官       XX XX        9130 2B00

発明の名称        XXXXシステム

請求項の数         13

特許出願人        XXXX株式会社

 

 この出願については、拒絶の理由を発見しないから、特許査定をします。

 

部長/代理  審査長/代理 審査官    審査官補    分類確定官 XXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXX     

1.出願種別        通常

2.参考文献        有

3.特許法第30条適用   無

4.発明の名称の変更    無

5.国際特許分類(IPC)

          A01G 31/00   606,
          A01G 27/00   502K,
          A01G 27/00   502L=
          A01G 13/00   302Z  

6.菌寄託

7.出願日の遡及を認めない旨の表示

参考情報

特許出願の番号      特願2007-XXXXXX 

1.調査した分野(IPC,DB名) 

 A01G  31/00
 A01G  27/00
 A01G  13/00     

2.参考特許文献

 特開2003-XXXXXX             (JP,A)
 特開2006-XXXXXX             (JP,A)    

3.参考図書雑誌

英訳文:

DECISION TO GRANT A PATENT

Patent Application No.: 2007-XXXXX

Drafting Date:          XXXXXX, 2008

Examiner:               XXXXXX XXXXXX, 9130 2B00

Title of the Invention: XXXXX system

Number of Claims:       13

Applicant:              XXXXX

 

No reason for rejection is found concerning the present application and, hence, a patent is granted.

 

(Acting) Division Manager   (Acting) Examiner-in-chief   Examiner   Assistant Examiner   Classification-finalizing officer  
XXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXX     

1.   Type of application                      General

2.   References                               Yes

3.   Application of Art. 30 of the Patent Law       No

4.   Change of Title of the Invention               No

5.   International Patent Classification (IPC)
                 A01G 31/00 606,
                 A01G 27/00 502K,
                 A01G 27/00 502L=
                 A01G 13/00 302Z 

6.   Depository of microorganisms

7.   Indication that the retroaction of the filing date is not permitted

Reference information

Patent Application No. 2007-XXXXXX

1.   Searched Field (IPC, DB name)
     A01G  31/00
     A01G  27/00
     A01G  13/00

2.   Reference patent document
     JP 2003-XXXXXX        (JP,A)
     JP 2006-XXXXXX        (JP,A)

3.   Reference literature/journal

タグ:

特許  出願  発明  日本  記載  提出  application  審査  拒絶  or  be  patent  先行技術  可能  請求項  出願人  特許出願  利用  審査官  開示  適用  Japan  方法  an  Patent  請求  Japanese  特許庁  外国  not  選択  filing  規定  with  通常  変更  情報  理由  filed  claim  拒絶理由  特許審査  先行技術文献  action  文献  date  Examination  at  意見書  技術  容易  one  引用  art  当業者  拒絶理由通知  特許法  採用  final  出願日  特許査定  invention  原文  present  調査  実施  claims  引用文献  any  内容  has  grant  prior  search  結果  office  30  通知  above  epo  file  been  英訳文  within  英訳  参照  代理人  Inter  分野  平成  限定  use  参考  issue  IP  may  phase  will  system  we  documents  should  method  under  made  29  事項  mentioned  results  構成  but  Article  having  Act  国内  inter  through  information  there  Application  based  Art  Prior  20  XXXXXX  would  so  ex  about  拒絶理由通知書  知識  foreign  following  31  時点  発見  和英  下記  re  特許法第  granted  publication  rejection  34  However  会社  comprising  Applicant  national  装置  意見  form  using  issued  International  想到  現時点  システム  XXXX  Therefore  further  out  XX  Invention  skill  希望  subject  Law  public  Ex  Search  Examiner  有無  either  XXXXX  遡及  question  Yes  person  日本国内  条第  00  do  PATENT  does  test  were  日以内  days  XXX  分析  response  刊行物  ep  those  21  Reference  make  side  国際特許  ordinary  A01G  Claim  reason  reasons  13  reference  50  40  available  番号  applied  document  cited  apparatus  difference  A01G  construction  条文  limit  Specification  country  name  below  11  references  rejected  her  found  測定  per  electric  Date  am  sea  inventions  item  Title  Claims  technique  term  his  herein  result  特開  連絡  notification  References  60  訳文  EC  本願請求項  described  description  could  調査結果  代理  以内  出願前  号公報  適宜選択  Open  pressure  reading  Laid  Unexamined  appropriate  表示  act  listed  There  lines  確定  hence  easily  特願  hereby  how  27  2007  特開昭  内部  特許文献  desired  発明又  day  exam  先行技術文献調査結果  Division  IPC  How  IPC  Assistant  Analysis  Thus  Type  記録  TEL  able  view  手法  名称  査定  over  please  perform  measuring  reject  measurement  国際  漏洩  分類  出願種別  利用可能  通信  起案日  超音波  JP  電気通信回線  302  2006  02  参考文献  公報  先行  特許庁審査官  圧力  被検査体  日本国  条適用  株式会社  oa  Reasons  Re  Refusal  mailing  absence  XXXXXXX  XXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXX  list  low  mm  read  publications  red  permitted  performing  presence  practicing  fr  forming  content  ed  discloses  easy  ip  became  invent  internal  concerning  inform  came  choose  Acting  Drafting  Dr  searched  try  Field  ultrasonic  Extension  An  Change  Classification  DE  GRANT  General  thereby 

PCT National Phase in Japan

Q1. What are the time limits for entering Japanese national phase under PCT Chapters I and II?

A1.  The time limit is 30 months from the earliest priority date (if any) or the international filing date of the PCT application for both Chapters I and II.

Q2. Are Japanese translations of the PCT specification, abstract and drawings necessary for entering the Japanese national phase?

A2.  Yes.  Japanese translations of the PCT specification, abstract and drawings must be filed with the Japan Patent Office.  Further, Japanese translations of amendments under PCT Article 19 and 34 (if any) should be filed with the Japanese translations of the specification, abstract and drawings.

Q3. The time limit for entering Japanese national phase is drawing near but it seems unlikely that a Japanese translation of the PCT specification can be timely prepared.  Does the JPO allow postponement of the filing of the Japanese translation? 

A3.  We can first file a “formal notice of entry into Japanese national phase” by the 30-month deadline for entry into Japanese national phase and, then, file Japanese translations of the PCT specification, abstract and drawings.  The formal notice can be prepared at our end based on the information shown in the cover page of the international publication.  The Japanese translations may be validly filed within 2 months from the date of the filing of the above-mentioned formal notice of entry.  No extra charge is necessary for such delayed filing of the Japanese translations.

Appeal against the Decision for Rejection

Q1. We understand that an Appeal can be filed against the Decision for Rejection.  What are the steps necessary for filing an Appeal?

A1.  Firstly, a Notice of Appeal, which is a formal document requesting the initiation of Appeal Proceedings, is filed by the deadline which is three months (for Applicants residing in Japan) or four months (for foreign Applicants) from the dispatch date of the Decision for Rejection. 

Further, any amendment  (if any) must be filed simultaneously with the filing of the Notice of Appeal.  (In the case of patent applications filed on or before March 31, 2007, divisional applications can be filed only simultaneously with the filing of the Notice of Appeal.  In the case of parent patent applications filed on or after April 1, 2007, divisional applications can be filed either before, simultaneously with or after the filing of the Notice of Appeal as long as it is before the expiration of the above-mentioned deadline for filing the Notice of Appeal.)  With respect to the amendment, please note that there is a restriction to the permissible claim amendments.  Please see section “Restriction to Permissible Claim Amendments after Final Rejection” for more details.

Next, any arguments, reference materials and/or experimental reports are filed as an Appeal Brief (i.e., Reasons for Appeal).  The Appeal Brief can be filed either simultaneously with the Notice of Appeal or after the filing of the Notice of Appeal.  When the Appeal Brief is not filed with the Notice of Appeal, the due date for filing the Appeal Brief will be set by the Japan Patent Office, and it is usually about 2 months from the filing date of the Notice of Appeal.

Q2. Is it possible to obtain any extension of deadline for filing the Notice of Appeal or the Appeal Brief?

A2.  No.  The deadlines for filing a Notice of Appeal and an Appeal Brief are non-extensible

Q3. Is it possible to submit new experimental data in the appeal stage?

A3.  Yes.  Any experimental data can be filed together with the Appeal Brief except that effectiveness of data may vary depending on the purpose of the data.

Submission of data for demonstrating novelty and/or inventive step of an invention over prior art is effective if the data itself is appropriate for this purpose; whereas data submitted at the appeal stage cannot compensate for the lack of enabling disclosure or lack of support in the specification, and such data are usually dismissed as late filed.

The Japanese patent system does not allow for applicants to establish the enabling disclosure requirement and/or supporting disclosure requirement through later-filed evidence. That is, these requirements must be satisfied by the patent application as filed, and later-filed data for making up the deficiency in this respect will not be admitted by the JPO.

Q4. Is there an opportunity to file additional amendments and/or divisional applications after the filing of the Notice of Appeal?

A4.  Concerning additional amendments after the filing of the Notice of Appeal, such additional amendments are admissible only when the applicant responds to a Notice of Rejection which may or may not be issued in the appeal stage.   That is, the applicant may not be given any opportunity to file an amendment after the filing of the Notice of Appeal.  Therefore, it is safer to consider that the time of filing of the Notice of Appeal is substantially the last chance to file amendments.

On the other hand, as mentioned in A1 above, in the case of patent applications filed on or after April 1, 2007, divisional applications may be filed even after the filing of the Notice of Appeal as long as it is before the expiration of the deadline for filing the Notice, i.e., three months (for Applicants residing in Japan) or four months (for foreign Applicants) from the dispatch date of the Decision for Rejection.

タグ:

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