following

宣誓供述書の書き方について(2):米国(Part 2)

[例2] この例においては、[例1]のように宣誓供述書の供述内容を別紙のExhibit(甲号証又は乙号証)とはしていません。また、発明者以外によって署名された例です。

内容としては、医療装置(変形爪の矯正装置)に関する二次的考慮事項(商業的成功など)に関して提出したものです。(米国出願の中間処理において弊所が実際に提出したものに基づいていますが、固有名詞・用語・数値などは適宜変更してあります。)

(商業的成功に関する宣誓供述書の書式の1例)

IN THE U.S. PATENT AND TRADEMARK OFFICE

Applicant:Taro YAMADA
Serial No.:XX/XXX,XXX
Filed:XXXX, 20XX
For:APPARATUS FOR CORRECTING AN INGROWN NAIL
Art Unit:3772
Examiner:Dan HICKS

 



DECLARATION UNDER 37 C.F.R. 1.132

 

    I, Goro Kimura, a Japanese citizen residing at XXXX, Tokyo, Japan, declare and say: 
    I was graduated from the Faculty of Medicine, XXX University in March 2005.
    In April 2005, I entered XYZ Clinic where I have been practicing the treatment of hallux valgus and ingrown nails.
    I am well familiar with the present case.
    I read and understood the Office Action dated XXXX, 2011 and references cited therein. I have carried out treatments of ingrown nails with the apparatus disclosed in claim 1 of the present application at XYZ Clinic following the instructions given by Mr. Taro Yamada who is the director of the clinic and is the inventor of the present application. Some of the results of the treatments are as reported in the website of XYZ Clinic at http://www.adcdefg-hijk.com.
    In the website, three cases of treatments are reported.  The treatments were performed using an apparatus as shown in Fig. A attached hereto.  As can be seen from Fig. A, the apparatus falls within the scope of claim 1 of the present application.
    As to the three cases (cases 1 to 3), the nails before and after the treatments are shown in Figs. B, C and D attached hereto, which are also shown at the above-mentioned website of XYZ Clinic.  In each of the tree treatments, the apparatus as shown in Fig. A was used as mentioned above.  Further, the reagents and operations in cases 1 to 3 were substantially the same as recited in Example 1 of the present application (paragraphs [00XX] to [00XX] of the specification of the present application) except that the inclination angle A of the lifting members, the lifting intervals and the nail correcting force were slightly varied depending on the characteristics of the ingrown nails of the patients.  As reported in the website of XYZ Clinic, the details of cases 1 to 3 are as follows.

Case 1:
Patient's gender and age:
    A female in her 30's.

Patient's background: 
    The patient wished to avoid a painful treatment because she had heard her acquaintance's report about having received a very painful operation for correcting an ingrown nail at another hospital which seemed to have been carried out without anesthesia.  The patient came to XYZ Clinic because she was attracted by the painless treatment of this clinic.

Results:
    The ingrown nail was corrected as shown in Fig. B by a single treatment which took about only 30 minutes.  The patient was satisfied with the results of the treatment because the ingrown nail had been corrected without feeling any pain during and after the treatment.

Case 2:
Patient's gender and age:
 
    A female in her 40's.

Patient's background: 
    The patient had a previous experience of nail-correction using a wire device which is to be hooked to the edges of the ingrown sides of the nail and is designed to lift the ingrown sides by pulling the hooked portions of the wire toward the center of the nail.
    However, she needed to go to the hospital so frequently that it became troublesome to her. As a result, the patient stopped going to the hospital before the completion of the nail correction.
    The patient also had a previous experience of nail-correction using a correction plate which is to be adhered on the surface of an ingrown nail and lifts the ingrown sides of the nail by the spring force of the plate, but the plate came off from the nail soon.

Results: 
    The ingrown nail was corrected as shown in Fig. C by performing twice an approx. 30-minute treatment, and the patient was pleased with the result.

Case 3:
Patient's gender and age: 
    A female in her 50's.

Patient's background: 
    Previously, the patient had her ingrown nail corrected by treatment using a wire device similar to that used by the patient of case 2, which treatment lasted about 18 months. However, the ingrown nail recurred after the termination of the treatment.

Results: 
    The ingrown nail was corrected as shown in Fig. D by a single approx. 30-minute treatment.  During and after the treatment, the patient did not feel any pain nor uncomfortable feeling.

    Finally, it should be added that almost all of the 900 patients having received this treatment so far were very satisfied with the results.

    From the above, it is apparent that the apparatus of the present invention surely enables the correction of an ingrown nail within a very short period of time, 1.e., within about 30 minutes to about 1 hour, with a very simple operation and without causing any pain nor uncomfortable feeling to the patent.
    Thus, the apparatus of the present invention has realized a surprisingly easy and effective treatment which is far more advantageous than the conventional surgical removal method which is complicated, cumbersome and is accompanied by pain during or after the surgery and risk of microbial infection, and the conventional treatments using various correction devices or apparatuses which are in many cases not so effective and require very long treatment periods.

    The undersigned petitioner declares that all statements made herein of his own knowledge are true and that all statements made on information and belief are believed to be true; and further that these statements were made with the knowledge that willful false statements and the like so made are punishable by fine or imprisonment, or both, under Section 1001 of Title 18 of the United States Code and that such willful false statements may jeopardize the validity of the application or any patent issuing thereon.

Date:

(宣誓者の署名)
Goro Kimura

タグ:

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Samples

The following is a list of some examples of US patents obtained through our firm.

We suppose that it might be rather difficult for most of the non-Japanese clients to evaluate the quality of our works done for Japanese IP rights.

For such non-Japanese clients, the US patents listed may be useful for evaluating our abilities. We always dedicate tremendous efforts to draft English claims and specifications properly. For example, in the case of PCT applications, we draft Japanese specifications for PCT based on Japanese patent applications which had often been prepared and filed through other Japanese IP firms or by Japanese applicants themselves.

We usually make considerable modifications to the original Japanese specifications and claims for filing PCT applications. Especially in the case where the basic Japanese application has not been filed through our firm, we thoroughly check the application and usually redraft the claims into a form which has more clear and logical construction and can cover a desired protective scope, and also redraft the specification by supplementing information necessary to enable the invention or information which might be useful in the later prosecution stage for overcoming possible rejections.

Therefore, it can be said that, in many cases, the US patents are our translations of the Japanese language PCT specifications drafted by our firm.

We sometimes ask US patent attorneys to check our drafts of English specifications, but they usually find that no substantial change is necessary.

In addition, during the prosecutions of the foreign patent applications, our draft responses (amendments and arguments) are usually submitted to the patent offices without any substantial changes or with only minor changes.

Consequently, we believe that the US patents listed here would be of great help for you to evaluate our skills in IP business.

The documents which we prepare have been highly esteemed by the foreign patent attorneys.

タグ:

PCT  application  or  be  patent  Japan  an  Japanese  not  filing  with  filed  claim  at  one  invention  claims  any  has  applications  office  file  only  been  case  such  use  other  into  IP  may  we  more  documents  specification  all  but  right  non  We  necessary  also  amendment  through  information  based  patents  translations  applicant  would  so  amendments  ex  possible  high  rights  foreign  following  time  said  scope  re  end  rejection  without  business  English  obtained  form  prepared  cases  Therefore  out  skill  quality  example  many  during  prosecution  do  clients  substantial  stage  usually  firm  response  translation  some  where  ep  clear  obtain  original  later  make  side  had  document  construction  basic  they  her  specifications  firms  per  applicants  am  work  always  addition  arguments  attorneys  drafted  often  nor  cover  submitted  times  useful  listed  There  specific  draft  highly  desired  change  exam  done  Consequently  able  amend  language  late  up  over  reject  minor  most  skills  submit  help  special  offices  abilities  man  list  low  logical  might  rather  red  redraft  prosecutions  protective  considerable  great  examples  evaluating  esteemed  evaluate  ed  find  invent  attorney  believe  inform  check  changes  suppose  Especially  works  way 

《特許出願明細書》

分野 : バイオテクノロジー(細胞生物学) (和英)

原文:

更に、MAPKキナーゼの活性化には、キナーゼドメインVIIとVIIIの境界領域にある2つのセリン及び/又はスレオニン残基(即ち、2つのセリン残基、2つのスレオニン残基又はセリンとスレオニン残基)のリン酸化が必要で、このリン酸化を担うセリン/スレオニンキナーゼをMAPKKキナーゼ(MAPKKK)と総称する。前記のRaf-1はMAPKKキナーゼの一種であり、Ras→Raf-1(即ち、MAPKKK)→MAPKK→MAPKという連鎖は、シグナル伝達の主要経路の一つである。MAPKKK→MAPKK→MAPKという3分子からなるキナーゼの連鎖をMAPキナーゼシグナルカスケードと呼ぶ。

英訳文:

For activating a MAPK kinase, it is necessary to phosphorylate two serine and/or threonine residues (i.e., two serine residues, two threonine residues, or one serine residue and one threonine residue) located in the boundary region between the kinase subdomains VII and VIII, and a serine/threonine kinase responsible for this phosphorylation is designated MAPKK kinase (MAPKKK). The above-mentioned Raf-1 is one example of MAPKK kinase, and the following cascade reaction: Ras → Raf-1 (i.e., MAPKKK) → MAPKK → MAPK, is one of the major signal transduction pathways. The cascade reaction consisting of three kinase molecules, MAPKKK → MAPKK → MAPK, is called a MAP kinase signal cascade.

分野:バイオテクノロジー(遺伝子工学) (和英)

原文:

SIIS-1発現プラスミドの構築上記(ii)で単離したSIIS-1cDNAを制限酵素XbalとPvuIIで消化し、得られた制限酵素断片をブラントエンド化し、哺乳動物発現ベクターpEF-BOSのブラントエンド化したXbalサイトに挿入した。以下、構築したSIIS-1発現ベクターをpEF-BOS/SIIS-1(SH+)とする。SH2領域を欠損した変異型SIIS-1を構築するために、pEF-BOS/SIIS-1(SH+)を制限酵素BssHIIで消化し、生じた360bpの断片を除去した。得られたSH2領 域及びC末端の領域を欠損したSIIS-1発現ベクター(即ち、SIIS-1変異ベクター)を、pEF-BOS/SIIS-1(SH-)とした。 上記で構築したpEF-BOS/SIIS-1(SH+)又はpEF-BOS/SIIS-1(SH-)のいずれか一方の発現ベクターとネオマイシン耐性遺伝子をコードするpSV2 Neoとを20:1の比率で混ぜ、M1細胞にエレクトロポレーション法で形質導入した。ネオマイシン耐性を指標とし、形質導入体(クローン)をGeneticin(米国、GIBCOBRL社製)750μg/mlを含む成長培地中で選択した。

英訳文:

Construction of SIIS-1 expression vectors: SIIS-1 cDNA isolated in step (ii) above was digested with restriction enzymes XbaI and PvuII, and the end of the obtained restriction fragment (XbaI-PvuII) was converted into a blunt end. Then, the resultant blunt-ended fragment was inserted into the blunt-ended XbaI site of the mammalian expression vector pEF-BOS. Hereinafter, the constructed SIIS-1 expression vector is simply referred to as "pEF-BOS/SIIS-1 (SH+)". For the construction of a mutant SIIS-1 which is an SH2 domain-deficient SIIS-1, a BssHII-digested fragment of 360 bp was removed from pEF-BOS/SIIS-1 (SH+). The thus obtained SIIS-1 expression vector (that is, a mutant SIIS-1 vector) which is deficient in the SH2 domain and is truncated at the C-terminus is hereinafter simply referred to as "pEF-BOS/SIIS-1 (SH-)". Each of the expression vectors pEF-BOS/SIIS-1 (SH+) and pEF-BOS/SIIS-1 (SH-) prepared above was individually mixed with expression vector pSV2 Neo (encoding a neomycin-resistance gene) at a ratio of 20:1. Subsequently, each of the resultant vector mixtures was separately transfected into M1 cells by electroporation. Using neomycin resistance as an index, the transfectants (i.e., clones) were selected in the growth medium containing Geneticin (manufactured and sold by GIBCO BRL, USA) at 750 μg/ml.

分野 : 樹脂成形 (和英)

原文:

本発明の発泡射出成形方法によれば、金型キャビティ内壁面形状の転写性が良好で、無発泡の表皮層と高発泡の発泡層を有する成形品を再現性良く、効率的、経済的に製造することができるだけでなく、成形品の表皮層の厚さおよび成形品の発泡倍率を容易に制御することができる。

英訳文:

The foam-injection molding method of the present invention is advantageous not only in that a molded article which exhibits excellent reproduction of the morphology of the inner wall of the mold cavity and which has both a non-foamed surface skin layer and a highly foamed interior portion can be produced with excellent reproducibility and high efficiency and economically, but also in that the thickness of the surface skin layer and the expansion ratio of the molded article can be easily controlled. The foam-injection molding method of the present invention can provide various excellent foam-injection molded articles of a thermoplastic resin at a low cost.

分野 : 電気工学 (和英)

原文:

本発明は、複合色素及びn型半導体を包含する光電変換素子であって、該複合色素は、互いに 異なる励起準位を有する複数の成分色素が互いに化学結合されてなり、それにより、電子移動用の直鎖又は枝分かれ構造体を形成し、該直鎖又は枝分かれ構造体は一端において該n型半導体に保持され、他端は自由端であり、その励起準位が該直鎖又は枝分かれ構造体の上記のn型半導体に保持された端部から、上記の自由端に向かって減少する順序で配列されていることを特徴とする光電変換素子に関する。

英訳文:

The present invention is concerned with a photoelectric conversion element comprising a composite dye and an n-type semiconductor, the composite dye comprising a plurality of component dyes which have different excitation levels and which are chemically bonded to each other to form a straight chain or branched structure for transferring an electron therethrough, wherein the straight chain or branched structure is, at one end thereof, secured to the n-type semiconductor and has, at least at one other end thereof, a free end, and wherein the plurality of component dyes are arranged in an order such that the excitation levels of the plurality of component dyes are decreased as viewed from the one end of the structure toward the at least one other end of the structure.

分野 : 電気工学 (和英)

原文:

本発明の光電変換素子は、光電変換性能に優れ、特に、太陽エネルギーからのエネルギー取り 出し効率(エネルギー変換効率)が高く、また、それを用いて簡便に色素増感型太陽電池を製造 することができるので、色素増感型太陽電池などに有利に用いられる。

英訳文:

The photoelectric conversion element of the present invention exhibits excellent photoelectric conversion properties, especially high efficiency in converting solar energy to electric energy (i.e., high energy conversion efficiency), and a dye sensitized solar battery can be easily produced therefrom. Therefore, the photoelectric conversion element of the present invention can be advantageously used for a dye sensitized solar battery and the like.

分野 : 樹脂成形 (和英)

原文:

文明社会はエネルギーの消費によって成立するが、そのエネルギーの大部分は、自然が長年か けて太陽光エネルギーを蓄えた化石燃料に由来する。近年、その化石燃料の減少やその燃焼に よる地球温暖化問題が、人類社会の持続的発展の足かせとなる危惧が高まっている。 これらの問題を解決するために、太陽エネルギーから直接エネルギーを取り出す研究開発が盛 んに行われている。これらの中で、太陽電池は太陽エネルギーからのエネルギー取り出し効率 (エネルギー変換効率)が高いため多くの研究が為されている。とりわけ、色素に代表される光 増感剤を用い、その励起電子を効率よく取り出すことが可能な色素増感型太陽電池は、Michae l Gratzel等によって、エネルギー変換効率が7%を超えるシステムが発表(Nature 1991,353,737参照)されて以来、複雑な製造工程を経ず、安価に製造できる次世代の太陽 電池として注目を集めている。

英訳文:

Consumption of energy is indispensable to civilized society. Most of the energy which is consumed by civilized society is derived from fossil fuels, in which sunray energy has been accumulated over many years. In recent years, the problem that the amount of fossil fuels available is being reduced and the problem that the burning of fossil fuels causes global warming have arisen, and there is an increasing fear that these problems will be obstacles to the sustainable development of human society. For solving the above-mentioned problems, various studies have been made to directly utilize sunray energy. Among these studies, the studies on solar batteries have been vigorously made, because solar batteries exhibit high efficiency in converting solar energy to electric energy (i.e., high energy conversion efficiency). Among the solar batteries, special attention has been paid to a dye sensitized solar battery, which uses a photosensitizer, such as a dye, and which is capable of efficiently taking out electrons from the photosensitizer by the irradiation of the photosensitizer with sunray. Specifically, since Michael Gratzel et al. reported a system which uses a dye sensitized solar battery having an energy conversion efficiency of more than 7 % (see Nature 1991, 353, 737), a dye sensitized solar battery has drawn special attention as the next generation solar battery which can be produced at a low cost without use of a complicated method.

分野 : 鉄鋼技術、機械 (英和)

原文:

A production line for manufacturing hot steel strips from two casting lines (a, b) for thin slabs of thickness < 100 mm, only one of which (a) is aligned with a rolling line (e, g) characterized by comprising superimposed heating furnaces with mandrel (Al, A.2; Bl, B2), one pair on line (a) and one on line (b) respectively, both provided with internal mandrel to allow winding/unwinding steps of pre-strips having thickness lower than 30 mm, further comprising a bypass length (d) between said two furnaces (Al, A2) for the endless rolling in a finishing rolling mill (g) through a roller path (e), and a transverse path (k.) for transferring said pair of furnaces (Bl, B2) from line (b) to line (a) fox the production of single strips, there being provided an induction furnace (f) downstream of said heating furnaces with mandrel and immediately upstream of said finishing rolling mill (g).

和訳文:

熱間鋼帯を製造するための製造ラインであって、厚み100mm未満の薄いスラブ製造用の2つの鋳造ライン(a)及び(b)、該鋳造ライン(a)と直列に配置されてなる、ローラーコンベア(e)及び仕上用圧延機(g)を含む圧延ライン、上下に重なり合った加熱炉(A1)及び(A2)であって、該鋳造ライン(a)で製造されたスラブから得られる厚み30mm未満の仕上前鋳片の巻き取り及び巻き出し用マンドレルを内部に有しており、該鋳造ライン(a)に設けられた加熱炉(A1)及び(A2)、上下に重なり合った加熱炉(B1)及び(B2)であって、該鋳造ライン(b)で製造されたスラブから得られる厚み30mm未満の仕上前鋳片の巻き取り及び巻き出し用マンドレルを内部に有しており、鋳造ライン(b)に設けられた加熱炉(B1)及び(B2)、該鋳造ライン(a)で製造されたスラブを、ローラーコンベア(e)を介して仕上用圧延機(g)で連続的圧延に付すためのバイパス経路(d)であって、加熱炉(A1)と(A2)との間に設けられたバイパス経路(d)、加熱炉(B1)及び(B2)を、鋳造ライン(b)から鋳造ライン(a)に移動するための横断経路(k)、及びマンドレルを有する該加熱炉の下流であって、該仕上用圧延機(g)の直上流に設けられた誘導炉(f)、を含むことを特徴とする製造ライン。

タグ:

米国  発明  必要  上記  以下  or  be  可能  方法  an  成分  制限  not  選択  本発明  with  design  問題  特徴  action  at  技術  容易  one  art  invention  原文  present  after  any  has  導入  近年  above  製造  epo  複数  report  only  been  英訳文  英訳  参照  such  II  分野  工程  use  other  into  will  system  we  more  method  than  between  made  mentioned  III  all  but  解決  problem  having  non  necessary  also  inter  through  resin  was  there  A2  go  部分  A1  consisting  発表  エネルギー  step  type  both  so  excellent  ex  high  following  有利  サイト  和英  said  steps  re  ライン  成立  years  each  end  without  直接  single  comprising  heat  obtained  SIIS  form  prepared  energy  システム  Therefore  further  SIIS  out  動物  機械  two  solar  注目  properties  example  reaction  because  many  ii  provide  kinase  amount  used  least  do  ベクター  provided  year  referred  were  component  conduct  pEF  BOS  simply  index  plurality  conversion  respect  MAPKK  where  ep  化学  複雑  バイオテクノロジー  expression  効率的  articles  DNA  主要  obtain  和訳  structure  dye  efficiency  SH  restriction  main  MAPK  wherein  like  減少  制御  available  battery  細胞  designated  article  directly  construction  being  cost  一端  different  BOS  他端  production  containing  these  一種  開発  VIII  加熱炉  various  MAPKKK  her  pEF  per  element  electric  see  vector  three  am  its  sensitized  バイ  バイオ  B2  セリン  product  太陽  キナーゼ  term  単離  構築  his  herein  rolling  result  長年  該鋳造  order  変換  訳文  経済的  paid  SH  発現  converted  thus  threonine  以来  再現  スラブ  スレオニン  安価  効率  resistance  portion  遺伝子工学  電気工学  individual  順序  reported  ratio  鋳造  Raf  attention  製造用  枝分  VII  mandrel  未満  allow  act  photoelectric  構造体  located  There  less  構造  lines  easily  由来  B1  形成  foam  furnaces  exhibits  domain  due  highly  hereinafter  serine  batteries  耐性  代表  blunt  自然  内部  色素増感型太陽電池  dyes  development  保持  マンドレル  発泡倍率  composite  complicated  簡便  ended  concerned  cells  capable  光電変換素子  cascade  exam  converting  chemical  電池  配置  コード  advantage  able  XbaI  Specifically  Nature  view  late  manufacture  和訳文  residues  半導体  残基  since  injection  separate  樹脂  成形品  up  own  pair  型半導体  over  problems  produced  photosensitizer  path  変換効率  molded  molding  mutant  my  vectors  immediately  前記  fragment  fuels  制限酵素  surface  fossil  分子  therefrom  thickness  studies  sunray  strips  special  society  taking  酸化  連鎖  mm  Xbal  II  性能  指標  電子  除去  領域  エレクトロポレーション  研究  仕上前鋳片  仕上用圧延機  移動  比率  包含  伝達  化学結合  化石燃料  樹脂成形  欠損  消化  励起準位  発展  シグナル  該直鎖又  変異  表皮層  ローラーコンベア  リン  上下  経路  バイパス  ネオマイシン  ブラントエンド  英和  自由端  next  oa  neomycin  Ras  PvuII  SH2  mold  major  man  advantageous  low  mill  mm  ml  USA  range  MAP  Hereinafter  recent  red  free  fr  fox  foamed  deficient  heating  convert  finishing  excitation  exhibit  efficiently  ed  digested  fact  human  ip  invent  branched  internal  levels  layer  arranged  coding  increasing  civilized  causes  called  chain  uses  Each  respectively  resultant  responsible  Among  skin  BssHII  site  Bl  sold  straight  separately  semiconductor  signal  way  steel  transferring  transfer  toward  Gratzel  residue  Geneticin  thereof 

《拒絶理由通知、特許査定》

拒絶理由通知(和英)

原文:

 

拒絶理由通知書

特許出願の番号      特願2009-XXXXXX

起案日          平成21年XX月XX日

特許庁審査官       XX XX        3409 2J00

特許出願人代理人     XX XX 様

適用条文         第29条第2項

 

 この出願は、次の理由によって拒絶をすべきものです。これについて意見がありましたら、この通知書の発送の日から60日以内に意見書を提出してください。

理 由

 

 この出願の下記の請求項に係る発明は、その出願前日本国内又は外国において頒布された下記の刊行物に記載された発明又は電気通信回線を通じて公衆に利用可能となった発明に基いて、その出願前にその発明の属する技術の分野における通常の知識を有する者が容易に発明をすることができたものであるから、特許法第29条第2項の規定により特許を受けることができない。

記 (引用文献等は引用文献等一覧参照)

 ・請求項6 に対して 引用文献1,2

  請求項6には、「請求項1の方法を実施するために用いるシステムであって」と記載されているが、この記載は、システムの構成を限定するものではない。

 引用文献1には、被検査体の内部を減圧し、超音波を用いて被検査体の内圧を測定し、漏洩孔の有無を検査する装置が開示されている。

 そして、引用文献2には、圧力を超音波の位相差に基づいて測定する構成が開示されており、また、どのような手法により圧力を測定するかは、当業者が適宜選択すべき事項である。

 してみれば、引用文献1に記載の発明において、引用文献2に記載の圧力測定を採用することで、本願請求項6に係る発明とすることは、当業者にとって容易に想到し得ることである。

 よって、引用文献1,2に記載の発明に基いて、本願請求項6に係る発明とすることは、当業者にとって容易に想到し得ることである。


<拒絶の理由を発見しない請求項>

 請求項1-5に係る発明については、現時点では、拒絶の理由を発見しない。

拒絶の理由が新たに発見された場合には拒絶の理由が通知される。

引 用 文 献 等 一 覧

1.特開2004-XXXXX号公報

2.特開2002-XXXXXX号公報

------------------------------------

先行技術文献調査結果の記録

・調査した分野  IPC G01M3/00-3/40

             G01L11/00-11/06

・先行技術文献 

  特開2006-XXXXX号公報

  特開昭60-XXXXXX号公報

 この先行技術文献調査結果の記録は、拒絶理由を構成するものではない。

 この拒絶理由通知の内容に関するお問い合わせ、または面接のご希望がございましたら下記までご連絡下さい。

特許審査第1部 材料分析  XXXX

TEL.03(XXXX)XXXX 内線XXXX

 

英訳文:

Notification of Reasons for Refusal

Patent Application No.:    2009-XXXXXX

Drafting Date:   XXXXXX, 2009

Examiner:   XXXXXXX         3409 2J00

Agent for Applicant:  XXXXX XXXXXXX

Articles of the Patent Law applied to: Article 29, item 2

     The present application should be rejected for the following reasons.  A response to this notification, if any, should be filed within 60 days from the date of mailing of this notification. 

REASONS

     The invention of the below-mentioned claim of the present application could be easily made by those having ordinary skill in the art, based on either an invention described in the below-mentioned publications which were distributed prior to the filing date of the present application in Japan or in a foreign country or an invention which became available to the public through electric telecommunication lines prior to the filing date of the present application.  Therefore, the invention of the below-mentioned claim of the present application should not be patented under Article 29, item 2 of the Patent Law.

NOTE (References cited herein are listed below)

• Claim 6  -  to be rejected over References 1 and 2

     Claim 6 has a description reading: “a system for practicing the method of claim 1”.  However, this description does not limit the construction of the system.

     Reference 1 discloses an apparatus for performing a method comprising decompressing the inside of a test subject and measuring the internal pressure of the test subject by using an ultrasonic wave, to thereby determine the presence or absence of a leak hole.

     Reference 2 discloses a construction for measuring a pressure, based on a phase difference of ultrasonic waves.  Those having ordinary skill in the art may appropriately choose how to measure a pressure.

     Thus, it would be easy for those having ordinary skill in the art to use the pressure measurement technique of Reference 2 in the invention of Reference 1, to thereby make the invention of claim 6 of the present application.

     Therefore, based on the inventions of References 1 and 2, the invention of claim 6 of the present application would have been easily conceived by those having ordinary skill in the art.


     At present, there has been found no reason to reject claims 1 to 5.

     A further office action will be issued when there is found any reason to reject claims 1 to 5.

List of references cited

1.   Unexamined Japanese Patent Application Laid-Open Specification No. 2004-XXXXX

2.   Unexamined Japanese Patent Application Laid-Open Specification No. 2002-XXXXXX

--------------------------------------------------------------

Record of the results of the prior art search

• Field searched   IPC  G01M3/00-3/40

                           G01L11/00-11/06

• Prior art documents  

     Unexamined Japanese Patent Application Laid-Open Specification No. 2006-XXXXX

     Unexamined Japanese Patent Application Laid-Open Specification No. Sho 60-XXXXXX

      The above record of the prior art search does not constitute the reasons for rejection.

      If there is any question about the content of this notification of reasons for rejection or if an interview is desired, please contact the following person.

Examination Division 1, Materials Analysis, XXXXX XXXXX

TEL 03(XXXX)XXXX  Extension XXXX

 

特許査定(和英)

原文:

特許査定

特許出願の番号      特願2007-XXXXXX

起案日          平成20年 X月XX日

特許庁審査官       XX XX        9130 2B00

発明の名称        XXXXシステム

請求項の数         13

特許出願人        XXXX株式会社

 

 この出願については、拒絶の理由を発見しないから、特許査定をします。

 

部長/代理  審査長/代理 審査官    審査官補    分類確定官 XXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXX     

1.出願種別        通常

2.参考文献        有

3.特許法第30条適用   無

4.発明の名称の変更    無

5.国際特許分類(IPC)

          A01G 31/00   606,
          A01G 27/00   502K,
          A01G 27/00   502L=
          A01G 13/00   302Z  

6.菌寄託

7.出願日の遡及を認めない旨の表示

参考情報

特許出願の番号      特願2007-XXXXXX 

1.調査した分野(IPC,DB名) 

 A01G  31/00
 A01G  27/00
 A01G  13/00     

2.参考特許文献

 特開2003-XXXXXX             (JP,A)
 特開2006-XXXXXX             (JP,A)    

3.参考図書雑誌

英訳文:

DECISION TO GRANT A PATENT

Patent Application No.: 2007-XXXXX

Drafting Date:          XXXXXX, 2008

Examiner:               XXXXXX XXXXXX, 9130 2B00

Title of the Invention: XXXXX system

Number of Claims:       13

Applicant:              XXXXX

 

No reason for rejection is found concerning the present application and, hence, a patent is granted.

 

(Acting) Division Manager   (Acting) Examiner-in-chief   Examiner   Assistant Examiner   Classification-finalizing officer  
XXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXX     

1.   Type of application                      General

2.   References                               Yes

3.   Application of Art. 30 of the Patent Law       No

4.   Change of Title of the Invention               No

5.   International Patent Classification (IPC)
                 A01G 31/00 606,
                 A01G 27/00 502K,
                 A01G 27/00 502L=
                 A01G 13/00 302Z 

6.   Depository of microorganisms

7.   Indication that the retroaction of the filing date is not permitted

Reference information

Patent Application No. 2007-XXXXXX

1.   Searched Field (IPC, DB name)
     A01G  31/00
     A01G  27/00
     A01G  13/00

2.   Reference patent document
     JP 2003-XXXXXX        (JP,A)
     JP 2006-XXXXXX        (JP,A)

3.   Reference literature/journal

タグ:

特許  出願  発明  日本  記載  提出  application  審査  拒絶  or  be  patent  先行技術  可能  請求項  出願人  特許出願  利用  審査官  開示  適用  Japan  方法  an  Patent  請求  Japanese  特許庁  外国  not  選択  filing  規定  with  通常  変更  情報  理由  filed  claim  拒絶理由  特許審査  先行技術文献  action  文献  date  Examination  at  意見書  技術  容易  one  引用  art  当業者  拒絶理由通知  特許法  採用  final  出願日  特許査定  invention  原文  present  調査  実施  claims  引用文献  any  内容  has  grant  prior  search  結果  office  30  通知  above  epo  file  been  英訳文  within  英訳  参照  代理人  Inter  分野  平成  限定  use  参考  issue  IP  may  phase  will  system  we  documents  should  method  under  made  29  事項  mentioned  results  構成  but  Article  having  Act  国内  inter  through  information  there  Application  based  Art  Prior  20  XXXXXX  would  so  ex  about  拒絶理由通知書  知識  foreign  following  31  時点  発見  和英  下記  re  特許法第  granted  publication  rejection  34  However  会社  comprising  Applicant  national  装置  意見  form  using  issued  International  想到  現時点  システム  XXXX  Therefore  further  out  XX  Invention  skill  希望  subject  Law  public  Ex  Search  Examiner  有無  either  XXXXX  遡及  question  Yes  person  日本国内  条第  00  do  PATENT  does  test  were  日以内  days  XXX  分析  response  刊行物  ep  those  21  Reference  make  side  国際特許  ordinary  A01G  Claim  reason  reasons  13  reference  50  40  available  番号  applied  document  cited  apparatus  difference  A01G  construction  条文  limit  Specification  country  name  below  11  references  rejected  her  found  測定  per  electric  Date  am  sea  inventions  item  Title  Claims  technique  term  his  herein  result  特開  連絡  notification  References  60  訳文  EC  本願請求項  described  description  could  調査結果  代理  以内  出願前  号公報  適宜選択  Open  pressure  reading  Laid  Unexamined  appropriate  表示  act  listed  There  lines  確定  hence  easily  特願  hereby  how  27  2007  特開昭  内部  特許文献  desired  発明又  day  exam  先行技術文献調査結果  Division  IPC  How  IPC  Assistant  Analysis  Thus  Type  記録  TEL  able  view  手法  名称  査定  over  please  perform  measuring  reject  measurement  国際  漏洩  分類  出願種別  利用可能  通信  起案日  超音波  JP  電気通信回線  302  2006  02  参考文献  公報  先行  特許庁審査官  圧力  被検査体  日本国  条適用  株式会社  oa  Reasons  Re  Refusal  mailing  absence  XXXXXXX  XXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXX  list  low  mm  read  publications  red  permitted  performing  presence  practicing  fr  forming  content  ed  discloses  easy  ip  became  invent  internal  concerning  inform  came  choose  Acting  Drafting  Dr  searched  try  Field  ultrasonic  Extension  An  Change  Classification  DE  GRANT  General  thereby 

Exceptions to Lack of Novelty of Invention

Q1. We understand that Japan has a grace period for avoiding certain public disclosures from constituting prior art against a Japanese application.  How long is this grace period?

A1.  The grace period defined under Article 30 of the Japanese patent law (Exceptions to Lack of Novelty of Invention) is 6 months from the date of public disclosure.

Q2. What type of disclosures is capable of taking advantage of the Exceptions to Lack of Novelty of Invention in Japan?

A2.  According to current Article 30 of the Japanese patent law (effective as of April 1, 2012), virtually any disclosure, including “inventions made public at meetings and seminars, which are not academic conference designated by the Commissioner of the Patent Office, inventions made public on TV and radio, and inventions made public through sales”, are covered by the Exceptions to Lack of Novelty of Invention.  However, a patent publication is not a non-prejudicial disclosure.

Q3. Is the grace period applicable to scientific articles published on the web? 

A3.  The 6-month grace period is also applicable to electronic publications of scientific articles.  When a scientific article is published in the form of an electronic publication in advance to the publication in print, the 6-month grace period will start from the date of the electronic publication.  This rule applies not only to a free electronic publication, but also to an electronic publication which requires registered membership and/or purchase of the publication for accessing the electronic publication.

Q4. An invention has been published as a scientific article and a basic patent application has been filed in the US within 6 months from the publication of the scientific article.  Already 10 months have passed from the publication of the scientific article, but is it still possible to enjoy the benefit of the Japanese 6-month grace period by filing a Japanese patent application claiming the Paris convention priority from the basic US application filed within 6 months from the publication date? 

A4.  No.  Claiming of the Paris convention priority does not allow the filing date in Japan to date back for the purpose of grace period.  In other words, when a basic application is filed in other country within 6 months from the date of public disclosure, and a Japanese patent application claiming the convention priority from the basic application is filed after the expiration of the 6-months grace period, the Japanese patent application cannot enjoy the benefit of the grace period.

For receiving the benefit of the 6-month grace period in Japan, the Applicant must file within the 6-month grace period either one of the following applications:

   (1) Japanese national patent application*, or

   (2) PCT application designating Japan as one of the designated states. 

* Either a Japanese patent application or a PCT application claiming the convention priority from this Japanese patent application can be filed after the expiration of the grace period and still enjoy the benefit of the grace period.

Q5. What are the steps necessary for obtaining the benefit of the Japanese 6-month grace period?  

A5.  Necessary steps are explained separately for Japanese national patent application and PCT application.

Japanese national patent application:

A patent application is filed simultaneously with a Request for Grace Period within 6 months from the date of public disclosure.  Alternatively, the Request may be omitted by stating such effect in the patent application.

Next, a Document Verifying the Request, which is signed by all applicants, is filed within 30 days from the filing date of the patent application.  Filing of a specific evidence material (such as a copy of the scientific article disclosing the invention) is not required, but it is most advisable to file the evidence material with the Document.

PCT application designating Japan:

When a PCT application designating Japan as one of the designated states is filed within the 6 month grace period, such a PCT application will obtain the benefit of the grace period even when the PCT application enters the Japanese national phase after the expiration of the grace period (i.e., within non-extensible 30 month deadline).  In this case, both the Request for Grace Period and the Document Verifying the Request are filed within 30 days from the entry into the Japanese national phase. 

[Filing of the Request for Grace Period can be omitted when “Declaration as to Non-Prejudicial Disclosures or Exceptions to Lack of Novelty” (PCT Rule 4.17(v), 26ter.1) is made at the international stage.]

The Document Verifying the Request can be prepared at our end and forwarded for execution by the applicant(s). 

タグ:

PCT  application  or  be  patent  Japan  an  Patent  Japanese  not  filing  with  design  filed  claim  period  Office  date  at  Request  one  art  invention  after  any  has  prior  applications  grace  file  only  been  case  within  such  other  into  may  months  phase  will  priority  we  under  made  all  but  Article  non  law  must  We  necessary  also  inter  through  registered  A2  Art  A1  applicant  Rule  step  against  type  Novelty  both  so  ex  effective  possible  following  What  required  even  steps  re  month  publication  disclosure  end  However  Declaration  Q2  Q1  cannot  Applicant  national  April  form  prepared  long  Disclosure  claiming  including  Invention  international  rule  simultaneously  state  public  Ex  covered  either  do  Grace  Q3  does  A3  days  stage  ep  articles  obtain  benefit  Period  Claim  material  Q4  expiration  designated  article  electronic  scientific  A4  Filing  deadline  country  basic  her  per  Document  applicants  inventions  back  entry  evidence  his  Lack  convention  designating  members  cover  Exceptions  understand  web  words  Non  Next  require  defined  ratio  allow  omitted  specific  she  states  start  explained  extensible  execution  applies  day  enjoy  certain  capable  How  According  advantage  able  Verifying  requires  separate  up  isa  over  published  most  purpose  forwarded  taking  Re  Q5  academic  low  mm  meetings  read  publications  red  passed  Paris  free  fr  current  copy  effect  ed  disclosures  fine  ip  invent  applicable  try  A5  An  Claiming  separately  signed  still 

Change of Applicant of a Pending Patent Application

Q1. What are the documents necessary for changing the applicant of a pending Japanese application?

A1.  For recordal of a new applicant at the Japan Patent Office, we need an Assignment from the original applicant (assignor) to assign a part or whole of the right to obtain patent to the new applicant (assignee).  Specifically, the following documents must be filed with the Japan Patent Office:

   (1) An executed assignment simply signed by both parties (the assignor and the assignee), in which the full names and titles of the representatives of the assignor and the assignee should be clearly indicated.

   (2) A power of attorney executed by the assignee.

Neither notarization nor legalization of documents (1) and (2) are required.  These documents may be prepared at our end and forwarded for execution by the assignor and the assignee.

Q2. Does the Japan Patent Office issue an official certificate for the recordal of a new applicant?

A2.  No certificate is issued by the Japan Patent Office.  Recordal of a new applicant can be confirmed by checking the patent database.


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