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Welcome to the website of Inoue & Associates

Introductory Statement

Inoue & Associates (located within 1 minute walk from the Japan Patent Office) is an intellectual property (IP) firm having more than 35 years of experience in international IP business.

We are a modest-sized IP firm composed of members each having profound knowledge about the legal aspect of IP and the technologies involved therein as well as excellent skill in actual IP practice, such that high quality services can be offered constantly at a reasonable price.  Each one of our staff members is so trained as to be able to always provide high quality IP-related services including production of documents having a clear and logical construction whether they are in English or Japanese and irrespective of urgency or technical difficulties involved in particular cases.

Over the years, we have built up a solid reputation for our ability to efficiently acquire and protect IP rights in Japan.

We are confident that we can provide higher quality IP services than any other IP firms in Japan.


Features of Inoue & Associates

For acquiring and protecting patent rights, everything starts from the claims and specification of a patent application or a granted patent.  Whether a patent application can be granted with a desired protective scope or a granted patent can survive the challenge from a third party depends utterly on how good the claims and specification have been drafted in the first place.

Invalidation of patents, unexpectedly narrow scope of protection, defeat in infringement suit … all such undesired outcome could have been avoided only if the patent application had been better drafted. 

In the case of Japanese patent applications filed by non-Japanese entities, the claims and specification are usually translations from the non-Japanese texts of the first filed foreign applications or PCT applications. 

From this perspective, the translation of the patent claims and specification is actually more than just a translation and is practically tantamount to the preparation of a legal document which serves as a basis for seeking patent protection.  For this reason, the translation should be done with utmost care by IP professionals such as experienced patent attorneys or paralegals

And that is what we do and is not done by most of the IP firms in Japan

 

Problems related to traditional way of handling patent applications from outside Japan

In typical Japanese IP firms, applications from foreign clients are handled by a team of an IP professional (a patent attorney or a paralegal) and a translator. For example, the translation of a PCT specification for the Japan national phase entry is often carried out by one who is the least experienced in the IP firm or even by an outside translator.

The IP professions work on legal matters based on the translations prepared by translators which are not always so good or of a rather poor quality in many cases. This manner of handling patents is disadvantageous not only from the aspect of efficiency but also from the aspect of cost because poor translations of course make the entire procedure unnecessarily complicated and high translation fees are required even if the translations are not so good. Such inefficient and problematic practice as mentioned above has become customary because many Japanese IP professionals are not good at writing in English or even reading English documents, and the English-to-Japanese translations are generally assigned to beginners.

Consequently, many Japanese IP professionals have to rely on poor translations in their works, thus falling into a vicious cycle. It is not surprising even if patent applications from foreign clients are handled by those who do not fully understand what is disclosed in the original specification nor the clients’ instructions given in English during the prosecution of the application. For years, this has been a serious problem as far as the patent applications from outside Japan are concerned.

Our Solution

Such problems as mentioned above will never happen in the case of Inoue & Associates. Every one of our staff members has gone through very hard training and long actual experience to acquire ability to handle the IP cases alone from drafting patent specifications whether they are in Japanese or English to dealing with various procedures relating to patent applications or registered patents. We do not need and actually do not use any translator. Even in the case of foreign patent applications (in US, EP etc.) filed by Japanese applicants through our firm, the US or European patent attorneys often use our draft documents without any substantial change. That is, the documents drafted by Inoue & Associates as such are often submitted to the USPTO or the EPO.

There is no magic formula for acquiring good IP rights. This can be achieved only by hard work and skill obtainable through long and rich experience as always required in any fields for realizing high quality services.

Inoue & Associates is one of the very limited number of Japanese IP firms capable of constantly offering high quality IP services at a reasonable price. There has been and will be no compromise in the quality of services we provide to our clients and, for this very reason, we have been trusted by many foreign clients as well as domestic clients.

Our skill in IP business is highly esteemed by our clients including two famous Japanese professors emeriti, Dr. Nobuatsu Watanabe and Dr. Hidefumi Hirai, whose recommendations are shown in this web site. Further, if requested, we will be able to show you copies of some letters from various US and EP attorneys praising our abilities.

Our highly-skilled staff members will surely be of great help to your establishment of strong and valuable intellectual property portfolio while reducing cost.

If you are not sure, try us and we promise that we will never fall short of your expectations. You will immediately realize that we are dedicated to efficient acquisition and protection of your valuable intellectual properties and have skills to achieve this goal.

タグ:

PCT  EPO  application  or  be  patent  USPTO  Japan  an  Patent  Japanese  not  with  filed  claim  Office  EP  at  one  art  claims  any  has  grant  applications  request  above  file  only  been  case  within  such  use  other  into  IP  Statement  phase  will  European  we  more  documents  should  under  specification  than  mentioned  related  all  but  right  problem  having  non  services  We  also  inter  through  third  there  registered  based  go  patents  translations  applicant  so  excellent  ex  about  high  rights  practice  foreign  technical  required  scope  reasonable  even  re  fee  granted  years  each  end  without  Inoue  legal  party  business  English  national  Further  form  prepared  cases  etc  long  general  out  shown  including  international  skill  two  first  need  quality  properties  example  because  many  skilled  during  prosecution  provide  amount  their  least  do  year  Associates  very  clients  substantial  usually  respect  firm  given  translation  some  experience  ep  Intellectual  those  protection  clear  carried  obtain  original  Problem  make  matter  Property  side  efficiency  reason  knowledge  well  had  infringement  who  document  Solution  staff  construction  cost  limit  course  therein  Such  country  basis  production  they  outside  various  her  specifications  found  firms  per  applicants  see  good  am  poor  work  always  website  whether  product  attorneys  property  entry  intellectual  drafted  his  herein  expectation  limited  often  nor  members  disclosed  could  submitted  thus  understand  valid  web  vice  what  instruction  require  reading  ratio  ability  become  number  actually  act  place  closed  located  There  part  particular  care  specific  surely  far  fees  field  start  every  draft  how  highly  service  aspect  fields  desired  complicated  entire  concerned  change  capable  exam  done  Invalidation  Consequently  Trademark  Trade  advantage  able  acquire  actual  Services  valuable  late  requested  unexpected  instructions  short  show  serious  up  involved  isa  own  professionals  professional  problems  procedure  practically  minute  protecting  now  most  skills  immediately  texts  fully  handling  handled  submit  help  translator  solid  never  oa  State  abilities  man  advantageous  acquiring  logical  mm  Watanabe  manner  rather  read  Hirai  Hidefumi  red  professor  procedures  protective  price  Nobuatsu  fr  full  depends  generally  constantly  higher  hard  great  experienced  efficiently  establish  entities  everything  esteemed  ed  domestic  ip  avoided  attorney  Dr  Each  suit  try  trusted  Even  Every  rich  surprising  An  site  works  signed  way  while  utmost  trained  reputation 

Samples

The following is a list of some examples of US patents obtained through our firm.

We suppose that it might be rather difficult for most of the non-Japanese clients to evaluate the quality of our works done for Japanese IP rights.

For such non-Japanese clients, the US patents listed may be useful for evaluating our abilities. We always dedicate tremendous efforts to draft English claims and specifications properly. For example, in the case of PCT applications, we draft Japanese specifications for PCT based on Japanese patent applications which had often been prepared and filed through other Japanese IP firms or by Japanese applicants themselves.

We usually make considerable modifications to the original Japanese specifications and claims for filing PCT applications. Especially in the case where the basic Japanese application has not been filed through our firm, we thoroughly check the application and usually redraft the claims into a form which has more clear and logical construction and can cover a desired protective scope, and also redraft the specification by supplementing information necessary to enable the invention or information which might be useful in the later prosecution stage for overcoming possible rejections.

Therefore, it can be said that, in many cases, the US patents are our translations of the Japanese language PCT specifications drafted by our firm.

We sometimes ask US patent attorneys to check our drafts of English specifications, but they usually find that no substantial change is necessary.

In addition, during the prosecutions of the foreign patent applications, our draft responses (amendments and arguments) are usually submitted to the patent offices without any substantial changes or with only minor changes.

Consequently, we believe that the US patents listed here would be of great help for you to evaluate our skills in IP business.

The documents which we prepare have been highly esteemed by the foreign patent attorneys.

タグ:

PCT  application  or  be  patent  Japan  an  Japanese  not  filing  with  filed  claim  at  one  invention  claims  any  has  applications  office  file  only  been  case  such  use  other  into  IP  may  we  more  documents  specification  all  but  right  non  We  necessary  also  amendment  through  information  based  patents  translations  applicant  would  so  amendments  ex  possible  high  rights  foreign  following  time  said  scope  re  end  rejection  without  business  English  obtained  form  prepared  cases  Therefore  out  skill  quality  example  many  during  prosecution  do  clients  substantial  stage  usually  firm  response  translation  some  where  ep  clear  obtain  original  later  make  side  had  document  construction  basic  they  her  specifications  firms  per  applicants  am  work  always  addition  arguments  attorneys  drafted  often  nor  cover  submitted  times  useful  listed  There  specific  draft  highly  desired  change  exam  done  Consequently  able  amend  language  late  up  over  reject  minor  most  skills  submit  help  special  offices  abilities  man  list  low  logical  might  rather  red  redraft  prosecutions  protective  considerable  great  examples  evaluating  esteemed  evaluate  ed  find  invent  attorney  believe  inform  check  changes  suppose  Especially  works  way 

《特許出願明細書》

分野 : バイオテクノロジー(細胞生物学) (和英)

原文:

更に、MAPKキナーゼの活性化には、キナーゼドメインVIIとVIIIの境界領域にある2つのセリン及び/又はスレオニン残基(即ち、2つのセリン残基、2つのスレオニン残基又はセリンとスレオニン残基)のリン酸化が必要で、このリン酸化を担うセリン/スレオニンキナーゼをMAPKKキナーゼ(MAPKKK)と総称する。前記のRaf-1はMAPKKキナーゼの一種であり、Ras→Raf-1(即ち、MAPKKK)→MAPKK→MAPKという連鎖は、シグナル伝達の主要経路の一つである。MAPKKK→MAPKK→MAPKという3分子からなるキナーゼの連鎖をMAPキナーゼシグナルカスケードと呼ぶ。

英訳文:

For activating a MAPK kinase, it is necessary to phosphorylate two serine and/or threonine residues (i.e., two serine residues, two threonine residues, or one serine residue and one threonine residue) located in the boundary region between the kinase subdomains VII and VIII, and a serine/threonine kinase responsible for this phosphorylation is designated MAPKK kinase (MAPKKK). The above-mentioned Raf-1 is one example of MAPKK kinase, and the following cascade reaction: Ras → Raf-1 (i.e., MAPKKK) → MAPKK → MAPK, is one of the major signal transduction pathways. The cascade reaction consisting of three kinase molecules, MAPKKK → MAPKK → MAPK, is called a MAP kinase signal cascade.

分野:バイオテクノロジー(遺伝子工学) (和英)

原文:

SIIS-1発現プラスミドの構築上記(ii)で単離したSIIS-1cDNAを制限酵素XbalとPvuIIで消化し、得られた制限酵素断片をブラントエンド化し、哺乳動物発現ベクターpEF-BOSのブラントエンド化したXbalサイトに挿入した。以下、構築したSIIS-1発現ベクターをpEF-BOS/SIIS-1(SH+)とする。SH2領域を欠損した変異型SIIS-1を構築するために、pEF-BOS/SIIS-1(SH+)を制限酵素BssHIIで消化し、生じた360bpの断片を除去した。得られたSH2領 域及びC末端の領域を欠損したSIIS-1発現ベクター(即ち、SIIS-1変異ベクター)を、pEF-BOS/SIIS-1(SH-)とした。 上記で構築したpEF-BOS/SIIS-1(SH+)又はpEF-BOS/SIIS-1(SH-)のいずれか一方の発現ベクターとネオマイシン耐性遺伝子をコードするpSV2 Neoとを20:1の比率で混ぜ、M1細胞にエレクトロポレーション法で形質導入した。ネオマイシン耐性を指標とし、形質導入体(クローン)をGeneticin(米国、GIBCOBRL社製)750μg/mlを含む成長培地中で選択した。

英訳文:

Construction of SIIS-1 expression vectors: SIIS-1 cDNA isolated in step (ii) above was digested with restriction enzymes XbaI and PvuII, and the end of the obtained restriction fragment (XbaI-PvuII) was converted into a blunt end. Then, the resultant blunt-ended fragment was inserted into the blunt-ended XbaI site of the mammalian expression vector pEF-BOS. Hereinafter, the constructed SIIS-1 expression vector is simply referred to as "pEF-BOS/SIIS-1 (SH+)". For the construction of a mutant SIIS-1 which is an SH2 domain-deficient SIIS-1, a BssHII-digested fragment of 360 bp was removed from pEF-BOS/SIIS-1 (SH+). The thus obtained SIIS-1 expression vector (that is, a mutant SIIS-1 vector) which is deficient in the SH2 domain and is truncated at the C-terminus is hereinafter simply referred to as "pEF-BOS/SIIS-1 (SH-)". Each of the expression vectors pEF-BOS/SIIS-1 (SH+) and pEF-BOS/SIIS-1 (SH-) prepared above was individually mixed with expression vector pSV2 Neo (encoding a neomycin-resistance gene) at a ratio of 20:1. Subsequently, each of the resultant vector mixtures was separately transfected into M1 cells by electroporation. Using neomycin resistance as an index, the transfectants (i.e., clones) were selected in the growth medium containing Geneticin (manufactured and sold by GIBCO BRL, USA) at 750 μg/ml.

分野 : 樹脂成形 (和英)

原文:

本発明の発泡射出成形方法によれば、金型キャビティ内壁面形状の転写性が良好で、無発泡の表皮層と高発泡の発泡層を有する成形品を再現性良く、効率的、経済的に製造することができるだけでなく、成形品の表皮層の厚さおよび成形品の発泡倍率を容易に制御することができる。

英訳文:

The foam-injection molding method of the present invention is advantageous not only in that a molded article which exhibits excellent reproduction of the morphology of the inner wall of the mold cavity and which has both a non-foamed surface skin layer and a highly foamed interior portion can be produced with excellent reproducibility and high efficiency and economically, but also in that the thickness of the surface skin layer and the expansion ratio of the molded article can be easily controlled. The foam-injection molding method of the present invention can provide various excellent foam-injection molded articles of a thermoplastic resin at a low cost.

分野 : 電気工学 (和英)

原文:

本発明は、複合色素及びn型半導体を包含する光電変換素子であって、該複合色素は、互いに 異なる励起準位を有する複数の成分色素が互いに化学結合されてなり、それにより、電子移動用の直鎖又は枝分かれ構造体を形成し、該直鎖又は枝分かれ構造体は一端において該n型半導体に保持され、他端は自由端であり、その励起準位が該直鎖又は枝分かれ構造体の上記のn型半導体に保持された端部から、上記の自由端に向かって減少する順序で配列されていることを特徴とする光電変換素子に関する。

英訳文:

The present invention is concerned with a photoelectric conversion element comprising a composite dye and an n-type semiconductor, the composite dye comprising a plurality of component dyes which have different excitation levels and which are chemically bonded to each other to form a straight chain or branched structure for transferring an electron therethrough, wherein the straight chain or branched structure is, at one end thereof, secured to the n-type semiconductor and has, at least at one other end thereof, a free end, and wherein the plurality of component dyes are arranged in an order such that the excitation levels of the plurality of component dyes are decreased as viewed from the one end of the structure toward the at least one other end of the structure.

分野 : 電気工学 (和英)

原文:

本発明の光電変換素子は、光電変換性能に優れ、特に、太陽エネルギーからのエネルギー取り 出し効率(エネルギー変換効率)が高く、また、それを用いて簡便に色素増感型太陽電池を製造 することができるので、色素増感型太陽電池などに有利に用いられる。

英訳文:

The photoelectric conversion element of the present invention exhibits excellent photoelectric conversion properties, especially high efficiency in converting solar energy to electric energy (i.e., high energy conversion efficiency), and a dye sensitized solar battery can be easily produced therefrom. Therefore, the photoelectric conversion element of the present invention can be advantageously used for a dye sensitized solar battery and the like.

分野 : 樹脂成形 (和英)

原文:

文明社会はエネルギーの消費によって成立するが、そのエネルギーの大部分は、自然が長年か けて太陽光エネルギーを蓄えた化石燃料に由来する。近年、その化石燃料の減少やその燃焼に よる地球温暖化問題が、人類社会の持続的発展の足かせとなる危惧が高まっている。 これらの問題を解決するために、太陽エネルギーから直接エネルギーを取り出す研究開発が盛 んに行われている。これらの中で、太陽電池は太陽エネルギーからのエネルギー取り出し効率 (エネルギー変換効率)が高いため多くの研究が為されている。とりわけ、色素に代表される光 増感剤を用い、その励起電子を効率よく取り出すことが可能な色素増感型太陽電池は、Michae l Gratzel等によって、エネルギー変換効率が7%を超えるシステムが発表(Nature 1991,353,737参照)されて以来、複雑な製造工程を経ず、安価に製造できる次世代の太陽 電池として注目を集めている。

英訳文:

Consumption of energy is indispensable to civilized society. Most of the energy which is consumed by civilized society is derived from fossil fuels, in which sunray energy has been accumulated over many years. In recent years, the problem that the amount of fossil fuels available is being reduced and the problem that the burning of fossil fuels causes global warming have arisen, and there is an increasing fear that these problems will be obstacles to the sustainable development of human society. For solving the above-mentioned problems, various studies have been made to directly utilize sunray energy. Among these studies, the studies on solar batteries have been vigorously made, because solar batteries exhibit high efficiency in converting solar energy to electric energy (i.e., high energy conversion efficiency). Among the solar batteries, special attention has been paid to a dye sensitized solar battery, which uses a photosensitizer, such as a dye, and which is capable of efficiently taking out electrons from the photosensitizer by the irradiation of the photosensitizer with sunray. Specifically, since Michael Gratzel et al. reported a system which uses a dye sensitized solar battery having an energy conversion efficiency of more than 7 % (see Nature 1991, 353, 737), a dye sensitized solar battery has drawn special attention as the next generation solar battery which can be produced at a low cost without use of a complicated method.

分野 : 鉄鋼技術、機械 (英和)

原文:

A production line for manufacturing hot steel strips from two casting lines (a, b) for thin slabs of thickness < 100 mm, only one of which (a) is aligned with a rolling line (e, g) characterized by comprising superimposed heating furnaces with mandrel (Al, A.2; Bl, B2), one pair on line (a) and one on line (b) respectively, both provided with internal mandrel to allow winding/unwinding steps of pre-strips having thickness lower than 30 mm, further comprising a bypass length (d) between said two furnaces (Al, A2) for the endless rolling in a finishing rolling mill (g) through a roller path (e), and a transverse path (k.) for transferring said pair of furnaces (Bl, B2) from line (b) to line (a) fox the production of single strips, there being provided an induction furnace (f) downstream of said heating furnaces with mandrel and immediately upstream of said finishing rolling mill (g).

和訳文:

熱間鋼帯を製造するための製造ラインであって、厚み100mm未満の薄いスラブ製造用の2つの鋳造ライン(a)及び(b)、該鋳造ライン(a)と直列に配置されてなる、ローラーコンベア(e)及び仕上用圧延機(g)を含む圧延ライン、上下に重なり合った加熱炉(A1)及び(A2)であって、該鋳造ライン(a)で製造されたスラブから得られる厚み30mm未満の仕上前鋳片の巻き取り及び巻き出し用マンドレルを内部に有しており、該鋳造ライン(a)に設けられた加熱炉(A1)及び(A2)、上下に重なり合った加熱炉(B1)及び(B2)であって、該鋳造ライン(b)で製造されたスラブから得られる厚み30mm未満の仕上前鋳片の巻き取り及び巻き出し用マンドレルを内部に有しており、鋳造ライン(b)に設けられた加熱炉(B1)及び(B2)、該鋳造ライン(a)で製造されたスラブを、ローラーコンベア(e)を介して仕上用圧延機(g)で連続的圧延に付すためのバイパス経路(d)であって、加熱炉(A1)と(A2)との間に設けられたバイパス経路(d)、加熱炉(B1)及び(B2)を、鋳造ライン(b)から鋳造ライン(a)に移動するための横断経路(k)、及びマンドレルを有する該加熱炉の下流であって、該仕上用圧延機(g)の直上流に設けられた誘導炉(f)、を含むことを特徴とする製造ライン。

タグ:

米国  発明  必要  上記  以下  or  be  可能  方法  an  成分  制限  not  選択  本発明  with  design  問題  特徴  action  at  技術  容易  one  art  invention  原文  present  after  any  has  導入  近年  above  製造  epo  複数  report  only  been  英訳文  英訳  参照  such  II  分野  工程  use  other  into  will  system  we  more  method  than  between  made  mentioned  III  all  but  解決  problem  having  non  necessary  also  inter  through  resin  was  there  A2  go  部分  A1  consisting  発表  エネルギー  step  type  both  so  excellent  ex  high  following  有利  サイト  和英  said  steps  re  ライン  成立  years  each  end  without  直接  single  comprising  heat  obtained  SIIS  form  prepared  energy  システム  Therefore  further  SIIS  out  動物  機械  two  solar  注目  properties  example  reaction  because  many  ii  provide  kinase  amount  used  least  do  ベクター  provided  year  referred  were  component  conduct  pEF  BOS  simply  index  plurality  conversion  respect  MAPKK  where  ep  化学  複雑  バイオテクノロジー  expression  効率的  articles  DNA  主要  obtain  和訳  structure  dye  efficiency  SH  restriction  main  MAPK  wherein  like  減少  制御  available  battery  細胞  designated  article  directly  construction  being  cost  一端  different  BOS  他端  production  containing  these  一種  開発  VIII  加熱炉  various  MAPKKK  her  pEF  per  element  electric  see  vector  three  am  its  sensitized  バイ  バイオ  B2  セリン  product  太陽  キナーゼ  term  単離  構築  his  herein  rolling  result  長年  該鋳造  order  変換  訳文  経済的  paid  SH  発現  converted  thus  threonine  以来  再現  スラブ  スレオニン  安価  効率  resistance  portion  遺伝子工学  電気工学  individual  順序  reported  ratio  鋳造  Raf  attention  製造用  枝分  VII  mandrel  未満  allow  act  photoelectric  構造体  located  There  less  構造  lines  easily  由来  B1  形成  foam  furnaces  exhibits  domain  due  highly  hereinafter  serine  batteries  耐性  代表  blunt  自然  内部  色素増感型太陽電池  dyes  development  保持  マンドレル  発泡倍率  composite  complicated  簡便  ended  concerned  cells  capable  光電変換素子  cascade  exam  converting  chemical  電池  配置  コード  advantage  able  XbaI  Specifically  Nature  view  late  manufacture  和訳文  residues  半導体  残基  since  injection  separate  樹脂  成形品  up  own  pair  型半導体  over  problems  produced  photosensitizer  path  変換効率  molded  molding  mutant  my  vectors  immediately  前記  fragment  fuels  制限酵素  surface  fossil  分子  therefrom  thickness  studies  sunray  strips  special  society  taking  酸化  連鎖  mm  Xbal  II  性能  指標  電子  除去  領域  エレクトロポレーション  研究  仕上前鋳片  仕上用圧延機  移動  比率  包含  伝達  化学結合  化石燃料  樹脂成形  欠損  消化  励起準位  発展  シグナル  該直鎖又  変異  表皮層  ローラーコンベア  リン  上下  経路  バイパス  ネオマイシン  ブラントエンド  英和  自由端  next  oa  neomycin  Ras  PvuII  SH2  mold  major  man  advantageous  low  mill  mm  ml  USA  range  MAP  Hereinafter  recent  red  free  fr  fox  foamed  deficient  heating  convert  finishing  excitation  exhibit  efficiently  ed  digested  fact  human  ip  invent  branched  internal  levels  layer  arranged  coding  increasing  civilized  causes  called  chain  uses  Each  respectively  resultant  responsible  Among  skin  BssHII  site  Bl  sold  straight  separately  semiconductor  signal  way  steel  transferring  transfer  toward  Gratzel  residue  Geneticin  thereof 

《拒絶理由通知、特許査定》

拒絶理由通知(和英)

原文:

 

拒絶理由通知書

特許出願の番号      特願2009-XXXXXX

起案日          平成21年XX月XX日

特許庁審査官       XX XX        3409 2J00

特許出願人代理人     XX XX 様

適用条文         第29条第2項

 

 この出願は、次の理由によって拒絶をすべきものです。これについて意見がありましたら、この通知書の発送の日から60日以内に意見書を提出してください。

理 由

 

 この出願の下記の請求項に係る発明は、その出願前日本国内又は外国において頒布された下記の刊行物に記載された発明又は電気通信回線を通じて公衆に利用可能となった発明に基いて、その出願前にその発明の属する技術の分野における通常の知識を有する者が容易に発明をすることができたものであるから、特許法第29条第2項の規定により特許を受けることができない。

記 (引用文献等は引用文献等一覧参照)

 ・請求項6 に対して 引用文献1,2

  請求項6には、「請求項1の方法を実施するために用いるシステムであって」と記載されているが、この記載は、システムの構成を限定するものではない。

 引用文献1には、被検査体の内部を減圧し、超音波を用いて被検査体の内圧を測定し、漏洩孔の有無を検査する装置が開示されている。

 そして、引用文献2には、圧力を超音波の位相差に基づいて測定する構成が開示されており、また、どのような手法により圧力を測定するかは、当業者が適宜選択すべき事項である。

 してみれば、引用文献1に記載の発明において、引用文献2に記載の圧力測定を採用することで、本願請求項6に係る発明とすることは、当業者にとって容易に想到し得ることである。

 よって、引用文献1,2に記載の発明に基いて、本願請求項6に係る発明とすることは、当業者にとって容易に想到し得ることである。


<拒絶の理由を発見しない請求項>

 請求項1-5に係る発明については、現時点では、拒絶の理由を発見しない。

拒絶の理由が新たに発見された場合には拒絶の理由が通知される。

引 用 文 献 等 一 覧

1.特開2004-XXXXX号公報

2.特開2002-XXXXXX号公報

------------------------------------

先行技術文献調査結果の記録

・調査した分野  IPC G01M3/00-3/40

             G01L11/00-11/06

・先行技術文献 

  特開2006-XXXXX号公報

  特開昭60-XXXXXX号公報

 この先行技術文献調査結果の記録は、拒絶理由を構成するものではない。

 この拒絶理由通知の内容に関するお問い合わせ、または面接のご希望がございましたら下記までご連絡下さい。

特許審査第1部 材料分析  XXXX

TEL.03(XXXX)XXXX 内線XXXX

 

英訳文:

Notification of Reasons for Refusal

Patent Application No.:    2009-XXXXXX

Drafting Date:   XXXXXX, 2009

Examiner:   XXXXXXX         3409 2J00

Agent for Applicant:  XXXXX XXXXXXX

Articles of the Patent Law applied to: Article 29, item 2

     The present application should be rejected for the following reasons.  A response to this notification, if any, should be filed within 60 days from the date of mailing of this notification. 

REASONS

     The invention of the below-mentioned claim of the present application could be easily made by those having ordinary skill in the art, based on either an invention described in the below-mentioned publications which were distributed prior to the filing date of the present application in Japan or in a foreign country or an invention which became available to the public through electric telecommunication lines prior to the filing date of the present application.  Therefore, the invention of the below-mentioned claim of the present application should not be patented under Article 29, item 2 of the Patent Law.

NOTE (References cited herein are listed below)

• Claim 6  -  to be rejected over References 1 and 2

     Claim 6 has a description reading: “a system for practicing the method of claim 1”.  However, this description does not limit the construction of the system.

     Reference 1 discloses an apparatus for performing a method comprising decompressing the inside of a test subject and measuring the internal pressure of the test subject by using an ultrasonic wave, to thereby determine the presence or absence of a leak hole.

     Reference 2 discloses a construction for measuring a pressure, based on a phase difference of ultrasonic waves.  Those having ordinary skill in the art may appropriately choose how to measure a pressure.

     Thus, it would be easy for those having ordinary skill in the art to use the pressure measurement technique of Reference 2 in the invention of Reference 1, to thereby make the invention of claim 6 of the present application.

     Therefore, based on the inventions of References 1 and 2, the invention of claim 6 of the present application would have been easily conceived by those having ordinary skill in the art.


     At present, there has been found no reason to reject claims 1 to 5.

     A further office action will be issued when there is found any reason to reject claims 1 to 5.

List of references cited

1.   Unexamined Japanese Patent Application Laid-Open Specification No. 2004-XXXXX

2.   Unexamined Japanese Patent Application Laid-Open Specification No. 2002-XXXXXX

--------------------------------------------------------------

Record of the results of the prior art search

• Field searched   IPC  G01M3/00-3/40

                           G01L11/00-11/06

• Prior art documents  

     Unexamined Japanese Patent Application Laid-Open Specification No. 2006-XXXXX

     Unexamined Japanese Patent Application Laid-Open Specification No. Sho 60-XXXXXX

      The above record of the prior art search does not constitute the reasons for rejection.

      If there is any question about the content of this notification of reasons for rejection or if an interview is desired, please contact the following person.

Examination Division 1, Materials Analysis, XXXXX XXXXX

TEL 03(XXXX)XXXX  Extension XXXX

 

特許査定(和英)

原文:

特許査定

特許出願の番号      特願2007-XXXXXX

起案日          平成20年 X月XX日

特許庁審査官       XX XX        9130 2B00

発明の名称        XXXXシステム

請求項の数         13

特許出願人        XXXX株式会社

 

 この出願については、拒絶の理由を発見しないから、特許査定をします。

 

部長/代理  審査長/代理 審査官    審査官補    分類確定官 XXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXX     

1.出願種別        通常

2.参考文献        有

3.特許法第30条適用   無

4.発明の名称の変更    無

5.国際特許分類(IPC)

          A01G 31/00   606,
          A01G 27/00   502K,
          A01G 27/00   502L=
          A01G 13/00   302Z  

6.菌寄託

7.出願日の遡及を認めない旨の表示

参考情報

特許出願の番号      特願2007-XXXXXX 

1.調査した分野(IPC,DB名) 

 A01G  31/00
 A01G  27/00
 A01G  13/00     

2.参考特許文献

 特開2003-XXXXXX             (JP,A)
 特開2006-XXXXXX             (JP,A)    

3.参考図書雑誌

英訳文:

DECISION TO GRANT A PATENT

Patent Application No.: 2007-XXXXX

Drafting Date:          XXXXXX, 2008

Examiner:               XXXXXX XXXXXX, 9130 2B00

Title of the Invention: XXXXX system

Number of Claims:       13

Applicant:              XXXXX

 

No reason for rejection is found concerning the present application and, hence, a patent is granted.

 

(Acting) Division Manager   (Acting) Examiner-in-chief   Examiner   Assistant Examiner   Classification-finalizing officer  
XXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXXX     

1.   Type of application                      General

2.   References                               Yes

3.   Application of Art. 30 of the Patent Law       No

4.   Change of Title of the Invention               No

5.   International Patent Classification (IPC)
                 A01G 31/00 606,
                 A01G 27/00 502K,
                 A01G 27/00 502L=
                 A01G 13/00 302Z 

6.   Depository of microorganisms

7.   Indication that the retroaction of the filing date is not permitted

Reference information

Patent Application No. 2007-XXXXXX

1.   Searched Field (IPC, DB name)
     A01G  31/00
     A01G  27/00
     A01G  13/00

2.   Reference patent document
     JP 2003-XXXXXX        (JP,A)
     JP 2006-XXXXXX        (JP,A)

3.   Reference literature/journal

タグ:

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Utility Models

Q1. What are the differences between a patent and a utility model in Japan? 

A1.  The utility model system in Japan like in other countries having this system is for protecting minor innovations which are often called “small inventions”.

The distinct features of the utility model system are:  

     that a utility model registration is only for protecting “devices” related to shape or construction of articles or combination of articles (in other words, other inventions, such as methods, chemical compounds and pharmaceuticals, cannot be protected under utility model act);

     that a utility model is registered without substantive examination; and

     that a duration of a registered utility model is only 10 years from the filing date of the utility model application.

Differences between a patent and a utility model are summarized in the following Table.

  Patent Utility Model
Subject of protection Devices, methods, chemical compounds, etc. Devices related to shape or construction of articles or combination of articles (Methods, chemical compounds, etc. cannot be protected)
Application documents required Specification including Claims and Abstract; and, if any, Drawing(s) (optional) Specification including Claims and Abstract; and Drawing(s) (not omissible)
Substantive examination Request for Examination must be filed within 3 years from the filing date No substantive examination; Registered when basic formal requirements are fulfilled
Time period required for registration Possibly, several years from filing of the Request for Examination About 4-6 months from the filing date
Duration of protection 20 years from the filing date (may be extended in some cases) 10 years from the filing date (non-extensible)
Enforcement of right Enforceable based on granted patent Report of Utility Model Technical Opinion” is necessary for enforcing the utility model right

 

Q2. What is a “Report of Utility Model Technical Opinion”?

A2.  The Report of Utility Model Technical Opinion is an assessment report about the registrability (novelty, inventive step, etc.) of a utility model application or a registered utility model.  This report is prepared by an Examiner of the Japan Patent Office upon request and payment of official fees.  Anyone (that is, not only the Applicant of the utility model, but also any third party) can validly file a request for the Report.

As explained in item “A1” above, a utility model is registered without a substantive examination.  In this connection, for an owner of a utility model to enforce the utility model right against an infringer, firstly, a warning accompanied by the Report of Utility Model Technical Opinion must be sent to the infringer.  Therefore, the above-mentioned Report is necessary for instituting an infringement suit in Japan.

Q3. Is it possible to convert a patent application into a utility model application?

A3.  Yes.  Conversion of a patent application into a utility model application is allowed if an appropriate step is taken within 3 months (for Applicants residing in Japan) or 4 months (for Applicants residing outside Japan) from the mailing date of the Decision for Rejection, or within nine years and six months from the filing date of the patent application, whichever expires earlier.  Such a converted utility model application is entitled to the benefit of the filing date of the original patent application, and the original patent application is deemed to be withdrawn.

Q4. Is it possible to convert a utility model application into a patent application?

A4.  Yes.  Conversion of a utility model application (or a registered utility model resulting therefrom) into a patent application is allowed if an appropriate step is taken within 3 years from the filing date of the utility model application.  However, it should be noted that such conversion is not allowed after the applicant (or an assignee) has filed a request for the above-mentioned Report of Utility Model Technical Opinion, or after a 30-day period has passed from the date of a first official notice advising that a third party has filed a request for the Report of Utility Model Technical Opinion.  Such a converted patent application is entitled to the benefit of the filing date of the original utility model application, and the original utility model application is deemed to be withdrawn.  (Such a converted patent application cannot be converted back into a utility model application.)

タグ:

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